Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.31 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.31 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.31 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.31 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16590906 | 0.84 | — | — | |
| SCHEMBL14838098 | 0.82 | TDP1 (0.41) | TDP1MAPTCHRNB2CHRNB4CHRNA3 | |
| SCHEMBL16596689 | 0.81 | USP2 (0.32) | USP2MAPTTSHRCHRNB2CHRNB4 | |
| SCHEMBL16590884 | 0.77 | TDP1 (0.39) | TDP1 | |
| SCHEMBL15189382 | 0.77 | TDP1 (0.46) | TDP1MAPTTSHR | |
| SCHEMBL2742186 | 0.76 | TDP1 (0.42) | TDP1MAPTTSHR | |
| SCHEMBL2742174 | 0.76 | TDP1 (0.38) | TDP1TSHR | |
| SCHEMBL2742171 | 0.75 | TDP1 (0.37) | TDP1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL16683010 | 0.75 | TDP1 (0.44) | TDP1MAPTTSHR | |
| SCHEMBL16590881 | 0.74 | CHRNB2 (0.40) | TDP1MAPTCHRNB2CHRNB4CHRNA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |