SCHEMBL16590900

SCHEMBL16590900

C=Cc1ccc(OC2CCC(Oc3c(F)c(F)c(S(=O)(=O)O)c(F)c3F)CC2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PTPN1 P18031 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.39
▸ TEAD1 P28347 1/20 0.36
▸ EPHX2 P34913 5/20 0.34
▸ FAAH O00519 1/20 0.32
▸ MEN1 O00255 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ HPGD P15428 1/20 0.32
▸ CRY1 Q16526 1/20 0.31
▸ CRY2 Q49AN0 1/20 0.31
▸ PARP10 Q53GL7 1/20 0.31
▸ RAB9A P51151 1/20 0.31
▸ FPR2 P25090 1/20 0.31
▸ PROKR1 Q8TCW9 1/20 0.31
▸ PLA2G1B P04054 1/20 0.31
▸ ATG4B Q9Y4P1 1/20 0.31
▸ CHRNB2 P17787 1/20 0.30
▸ CHRNB4 P30926 1/20 0.30
▸ CHRNA3 P32297 1/20 0.30
▸ CHRNA7 P36544 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15189382 0.80 TDP1 (0.46) TDP1MEN1KMT2AHPGDRAB9A
SCHEMBL16683010 0.78 TDP1 (0.44) TDP1MEN1KMT2AHPGDRAB9A
SCHEMBL20266991 0.76 ALDH1A1 (0.48) PTPN1TEAD1HPGDPARP10CHRNB2
SCHEMBL15189394 0.75 CA12 (0.41) EPHX2HPGDPARP10MAPT
SCHEMBL14838098 0.74 TDP1 (0.41) PTPN1TDP1FAAHMEN1KMT2A
SCHEMBL10087723 0.73 THRA (0.35) EPHX2KMT2A
SCHEMBL16683031 0.73 TDP1 (0.41) TDP1HPGDRAB9AMAPTSMN1; SMN2
SCHEMBL16590884 0.72 TDP1 (0.39) TDP1
SCHEMBL2742174 0.72 TDP1 (0.38) TDP1MEN1KMT2AHPGDSMN1; SMN2
SCHEMBL2742176 0.71 TDP1 (0.42) TDP1KMT2AHPGDMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150086912-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-03-26 — — US disclosed
US-20150086912-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-03-26 — — US disclosed
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