SCHEMBL166077

SCHEMBL166077

CCOC=C[C]=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8855976 1.00
SCHEMBL28461325 0.84
SCHEMBL9495960 0.73
SCHEMBL1830146 0.72
SCHEMBL6818502 0.72
SCHEMBL248098 0.72
SCHEMBL1407387 0.71
SCHEMBL1407388 0.71
SCHEMBL8052611 0.71
SCHEMBL6109145 0.68 CASP1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1488 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350293-A1 I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN YOUNG CHANG CHEMICAL CO., LTD (KR) 2023-11-02 US claimed
EP-4220301-A1 I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN Young Chang Chemical Co., Ltd. (KR) 2023-08-02 EP claimed
CN-116194842-A Negative photoresist composition for I-line for improving step difference and LER between center and edge, and negative photoresist composition for I-line for improving process margin 荣昌化学制品株式会社 2023-05-30 CN claimed
CN-107924124-B Negative photoresist composition for I-line with excellent etching resistance 荣昌化学制品株式会社 2020-12-15 CN claimed
CN-111548627-A Intelligent anti-tissue-adhesion polymer composite material, anti-tissue-adhesion aqueous humor drainage device and preparation method thereof 复旦大学附属眼耳鼻喉科医院 2020-08-18 CN claimed
US-20180246404-A1 I-LINE NEGATIVE TYPE PHOTORESIST COMPOSITION HAVING EXCELLENT ETCHING RESISTANCE YCCHEM CO., LTD. (KR) 2018-08-30 US claimed
CN-107924124-A Negative photoresist composition for I-line with excellent etching resistance 荣昌化学制品株式会社 2018-04-17 CN claimed
US-9416084-B2 Method of producing ingenol-3-angelate LEO LABORATORIES LIMITED (IE) 2016-08-16 US claimed
EP-1663915-B1 METHOD FOR THE PRODUCTION OF [18F] FLUORIDE-MARKED AROMATIC L-AMINO ACIDS UNIV EBERHARD KARLS (DE) 2009-12-02 EP claimed
EP-0758897-B1 COMPOUNDS HAVING ANTIHYPERTENSIVE, CARDIOPROTECTIVE, ANTI-ISCHEMIC AND ANTILIPOLYTIC PROPERTIES AVENTIS PHARM PROD INC (US) 2004-02-25 EP claimed
EP-0580783-A1 USE OF AZEOTROPIC DISTILLATION IN PROCESS TO DRY 5-AMINO-N,N'BIS(2,3-DIHYDROXYPROPYL)-2,4,6-TRIIODOISOPHTHALAMIDE MALLINCKRODT MEDICAL, INC. (US) 1994-02-02 EP claimed
US-5256393-A Use of azeotropic distillation in process to dry 5-amino-N,N'bis (2,3-dihydroxypropyl)-2,4,6-triiodoisphthalamide MALLINCKRODT MEDICAL, INC. (US) 1993-10-26 US claimed
WO-1992018464-A1 USE OF AZEOTROPIC DISTILLATION IN PROCESS TO DRY 5-AMINO-N,N'BIS(2,3-DIHYDROXYPROPYL)-2,4,6-TRIIODOISOPHTHALAMIDE MALLINCKRODT MEDICAL, INC. (US) 1992-10-29 WO claimed
US-12037355-B2 Triterpene saponin analogues ADJUVANCE TECHNOLOGIES, INC. (US) 2024-07-16 US disclosed
CN-118355117-A Oligonucleotide compositions and methods thereof 波涛生命科学有限公司 2024-07-16 CN disclosed
WO-2024148274-A1 COMPLEMENT INHIBITION APELLIS PHARMACEUTICALS, INC. (US) 2024-07-11 WO disclosed
US-5256393-A Use of azeotropic distillation in process to dry 5-amino-N,N'bis (2,3-dihydroxypropyl)-2,4,6-triiodoisphthalamide MALLINCKRODT MEDICAL, INC. (US) 1993-10-26 US disclosed
WO-1992018464-A1 USE OF AZEOTROPIC DISTILLATION IN PROCESS TO DRY 5-AMINO-N,N'BIS(2,3-DIHYDROXYPROPYL)-2,4,6-TRIIODOISOPHTHALAMIDE MALLINCKRODT MEDICAL, INC. (US) 1992-10-29 WO disclosed
EP-0385062-A2 Process for the preparation of cytosines HÜLS AKTIENGESELLSCHAFT (DE) 1990-09-05 EP disclosed
EP-0302016-A1 N-alkenoyl enamides, their preparation and their use CIBA-GEIGY AG (CH) 1989-02-01 EP disclosed