Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.71 |
| ▸ | HIF1A | Q16665 | 4/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.41 |
| ▸ | HSPA5 | P11021 | 2/20 | 0.38 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 2/20 | 0.35 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.35 |
| ▸ | LMNA | P02545 | 3/20 | 0.35 |
| ▸ | MAPT | P10636 | 3/20 | 0.35 |
| ▸ | HPGD | P15428 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8346927 | 0.95 | AMY1A (0.62) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL278560 | 0.95 | AMY1A (0.62) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL8495178 | 0.95 | AMY1A (0.62) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL30002986 | 0.95 | AMY1A (0.62) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL8588031 | 0.95 | AMY1A (0.62) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL30374732 | 0.93 | AMY1A (0.59) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL278214 | 0.93 | AMY1A (0.59) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL7930652 | 0.88 | AMY1A (0.51) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL8755476 | 0.87 | AMY1A (0.51) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 | |
| SCHEMBL278376 | 0.87 | AMY1A (0.51) | AMY1AHIF1ACYP2C9CYP2C19SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-9110762-A | — | — | None | — | — | JP | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-117939914-A | Structure, display element, pattern for partition wall, and method for forming the same | 东京应化工业株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-111205648-B | Curable composition, cured product, microlens, and optical element | 东京应化工业株式会社 | 2023-12-08 | — | — | CN | disclosed |
| EP-3896522-B1 | PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| CN-106933034-B | Positive photoresist composition | 东京应化工业株式会社 | 2023-01-06 | — | — | CN | disclosed |
| US-11487200-B2 | Positive-type photosensitive resin composition and cured film prepared therefrom | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. | 2022-11-01 | — | — | US | disclosed |
| CN-108884574-B | Coating agent for forming metal oxide film and method for producing substrate having metal oxide film | 东京应化工业株式会社 | 2022-10-14 | — | — | CN | disclosed |
| EP-3961676-A1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-03-02 | — | — | EP | disclosed |
| US-20020182531-A1 | Positive photoresist composition | TOKYO OHKA KOGYO CO., LTD. | 2002-12-05 | — | — | US | disclosed |
| US-20020061458-A1 | Positive photoresist composition | TOKYO OHKA KOGYO CO., LTD. | 2002-05-23 | — | — | US | disclosed |
| EP-0769485-B1 | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL CO (JP) | 2002-03-13 | — | — | EP | disclosed |
| US-20020006574-A1 | Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | disclosed |
| US-20010026905-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2001-10-04 | — | — | US | disclosed |
| US-6245478-B1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-06-12 | — | — | US | disclosed |
| EP-0962826-A1 | A positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-12-08 | — | — | EP | disclosed |
| EP-0917000-A2 | Positive resist composition and method for forming a resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-05-19 | — | — | EP | disclosed |
| JP-H09110762-A | PENTAPHENOL COMPOUND AND ITS USE | SUMITOMO CHEM CO LTD | 1997-04-28 | — | — | JP | disclosed |
| EP-0769485-A1 | Positive resist composition and photosensitizers | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1997-04-23 | — | — | EP | disclosed |