SCHEMBL16640981

SCHEMBL16640981

BNCC1CCCC(CN(C)C)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8368347 0.83 SIGMAR1 (0.37)
SCHEMBL8366602 0.82 SIGMAR1 (0.33)
SCHEMBL19901777 0.82
SCHEMBL12849318 0.75 SIGMAR1 (0.32)
SCHEMBL19901806 0.74 CYP2D6 (0.36)
SCHEMBL8371082 0.74 EPHX2 (0.33)
SCHEMBL2076710 0.73
SCHEMBL5687213 0.71 SIGMAR1 (0.32)
SCHEMBL20323720 0.71 SIGMAR1 (0.32)
SCHEMBL16640978 0.71 ANPEP (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11840601-B2 Composition of alkoxysilyl-functionalized epoxy resin and composite thereof KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2023-12-12 US disclosed
US-20230159685-A1 Conjugated Diene-Based Polymer and Rubber Composition Comprising the Same LG CHEM, LTD. (KR) 2023-05-25 US disclosed
US-20230146440-A1 Oil-Extended Conjugated Diene-Based Polymer and Rubber Composition Comprising the Same LG CHEM, LTD. (KR) 2023-05-11 US disclosed
US-11161982-B2 Film forming composition and film forming method using the same MERCK PATENT GMBH (DE) 2021-11-02 US disclosed
US-20210115253-A1 FILM FORMING COMPOSITION AND FILM FORMING METHOD USING THE SAME MERCK PATENT GMBH (DE) 2021-04-22 US disclosed
US-9902803-B2 Epoxy compound having alkoxy silyl group, composition comprising same, cured product, use thereof and method for preparing epoxy compound having alkoxy silyl group KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2018-02-27 US disclosed
US-20170066789-A1 NOVEL EPOXY COMPOUND, MIXTURE, COMPOSITION, AND CURED PRODUCT COMPRISING SAME, METHOD FOR PREPARING SAME, AND USE THEREOF KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2017-03-09 US disclosed
US-20150105493-A1 EPOXY COMPOUND HAVING ALKOXY SILYL GROUP, COMPOSITION COMPRISING SAME, CURED PRODUCT, USE THEREOF AND METHOD FOR PREPARING EPOXY COMPOUND HAVING ALKOXY SILYL GROUP KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY (KR) 2015-04-16 US disclosed
EP-2065178-B1 GAS BARRIER FILM TORAY INDUSTRIES (JP) 2014-06-25 EP disclosed
US-8449982-B2 Gas barrier film TORAY INDUSTRIES, INC. (JP) 2013-05-28 US disclosed
US-8449982-B2 Gas barrier film TORAY INDUSTRIES, INC. (JP) 2013-05-28 US disclosed
US-20120288708-A1 GAS BARRIER FILM ARAI TAKASHI (JP) 2012-11-15 US disclosed
US-20120288708-A1 GAS BARRIER FILM ARAI TAKASHI (JP) 2012-11-15 US disclosed
US-8252421-B2 Gas barrier film TORAY INDUSTRIES, INC. (JP) 2012-08-28 US disclosed
US-8252421-B2 Gas barrier film TORAY INDUSTRIES, INC. (JP) 2012-08-28 US disclosed
US-20090263654-A1 GAS BARRIER FILM TORAY INDUSTRIES, INC. (JP) 2009-10-22 US disclosed
US-20090263654-A1 GAS BARRIER FILM TORAY INDUSTRIES, INC. (JP) 2009-10-22 US disclosed
EP-2065178-A1 GAS BARRIER FILM Toray Industries, Inc. (JP) 2009-06-03 EP disclosed