SCHEMBL1664166

SCHEMBL1664166

[c]1[c]cc2c([c]1)-c1ccccc1-c1ccccc1-c1ccccc1-2

nearest known ligand 0.31

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.31
MEN1 O00255 1/20 0.31
CES2 O00748 1/20 0.31
APAF1 O14727 1/20 0.31
TERT O14746 1/20 0.31
NPC1 O15118 1/20 0.31
PLIN1 O60240 1/20 0.31
TDP2 O95551 1/20 0.31
S1PR4 O95977 1/20 0.31
LMNA P02545 1/20 0.31
PLA2G1B P04054 1/20 0.31
BCHE P06276 1/20 0.31
POLB P06746 1/20 0.31
PTPRC P08575 1/20 0.31
MAPT P10636 1/20 0.31
THRB P10828 1/20 0.31
PLCG1 P19174 1/20 0.31
MAOA P21397 1/20 0.31
S1PR1 P21453 1/20 0.31
CES1 P23141 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1664629 1.00 KDM4E (0.31) KDM4EMEN1CES2APAF1TERT
SCHEMBL15602674 0.74 MEN1 (0.48) KDM4EMEN1CES2APAF1TERT
SCHEMBL1395707 0.73 BACE1 (0.34) LMNAMAPTMAPK1HTT
SCHEMBL15062393 0.70 MEN1 (0.42) KDM4EMEN1CES2APAF1TERT
SCHEMBL451060 0.68 KDM4E (0.32) KDM4EMEN1CES2APAF1TERT
SCHEMBL17418147 0.66
SCHEMBL1664505 0.62 ALDH1A1 (0.39) MAPK1
SCHEMBL15062485 0.62 MEN1 (0.32) KDM4EMEN1CES2APAF1TERT
SCHEMBL58152 0.62 MEN1 (0.61) KDM4EMEN1CES2APAF1TERT
SCHEMBL11875421 0.62 MEN1 (0.61) KDM4EMEN1CES2APAF1TERT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2311918-B1 Ink composition, and inkjet recording method FUJIFILM CORP (JP) 2014-10-22 EP disclosed
US-8211508-B2 radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; cyclic monofunctional acrylic or N-vinyl monomers FUJIFILM CORPORATION (JP) 2012-07-03 US disclosed
EP-2311918-A1 Ink composition, and inkjet recording method FUJIFILM Corporation (JP) 2011-04-20 EP disclosed
US-20080075882-A1 PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2008-03-27 US disclosed