SCHEMBL1664650

SCHEMBL1664650

[c]1[c]cc2c([c]1)Nc1ccccc1S2

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOX1 Q9Y5S8 10/20 0.53
MAPT P10636 7/20 0.53
GAA P10253 6/20 0.53
MEN1 O00255 3/20 0.53
KMT2A Q03164 3/20 0.53
SNCA P37840 3/20 0.53
ALOX15 P16050 3/20 0.53
BCHE P06276 2/20 0.53
ACHE P22303 2/20 0.53
TDP1 Q9NUW8 2/20 0.53
CYP1A2 P05177 2/20 0.53
POLB P06746 1/20 0.53
CYP3A4 P08684 1/20 0.53
ADORA3 P0DMS8 1/20 0.53
ALOX12 P18054 1/20 0.53
MAOA P21397 1/20 0.53
CNR1 P21554 1/20 0.53
PTGS1 P23219 1/20 0.53
SLC6A2 P23975 1/20 0.53
HTR2C P28335 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL852047 0.77 NOX1 (0.55) NOX1MAPTGAAMEN1KMT2A
Phenothiazine SCHEMBL29352248 0.72 NOX1 (1.00) NOX1MAPTGAAMEN1KMT2A
Phenothiazine SCHEMBL29349533 0.72 NOX1 (1.00) NOX1MAPTGAAMEN1KMT2A
Phenothiazine SCHEMBL2504207 0.72 NOX1 (1.00) NOX1MAPTGAAMEN1KMT2A
Phenothiazine SCHEMBL9114 0.72 NOX1 (1.00) NOX1MAPTGAAMEN1KMT2A
Phenothiazine SCHEMBL6315328 0.72 NOX1 (1.00) NOX1MAPTGAAMEN1KMT2A
Phenothiazine SCHEMBL23295987 0.70 NOX1 (0.94) NOX1MAPTGAAMEN1KMT2A
Phenothiazine SCHEMBL22467847 0.70 NOX1 (0.94) NOX1MAPTGAAMEN1KMT2A
Phenothiazine SCHEMBL21635186 0.70 NOX1 (0.94) NOX1MAPTGAAMEN1KMT2A
Phenothiazine SCHEMBL22467844 0.70 NOX1 (0.94) NOX1MAPTGAAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023013697-A1 MATERIAL FOR METAL PATTERNING, FLUORO COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENCE DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2023-02-09 WO disclosed
EP-2767407-B1 Ink-jet recording method and device FUJIFILM CORP (JP) 2015-12-02 EP disclosed
US-8888246-B2 Inkjet recording method and inkjet recording device FUJIFILM CORPORATION (JP) 2014-11-18 US disclosed
EP-2311918-B1 Ink composition, and inkjet recording method FUJIFILM CORP (JP) 2014-10-22 EP disclosed
US-20140232790-A1 INKJET RECORDING METHOD AND INKJET RECORDING DEVICE FUJIFILM CORPORATION (JP) 2014-08-21 US disclosed
EP-2767407-A1 Ink-jet recording method and device FUJIFILM Corporation (JP) 2014-08-20 EP disclosed
US-8211508-B2 radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; cyclic monofunctional acrylic or N-vinyl monomers FUJIFILM CORPORATION (JP) 2012-07-03 US disclosed
EP-2311918-A1 Ink composition, and inkjet recording method FUJIFILM Corporation (JP) 2011-04-20 EP disclosed
US-20080075882-A1 PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2008-03-27 US disclosed