Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 6/20 | 0.51 |
| ▸ | RAB9A | P51151 | 3/20 | 0.51 |
| ▸ | NPC1 | O15118 | 2/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.51 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.51 |
| ▸ | HPGD | P15428 | 1/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.48 |
| ▸ | POLB | P06746 | 3/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | MAOA | P21397 | 4/20 | 0.47 |
| ▸ | MAOB | P27338 | 3/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | GPR3 | P46089 | 1/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2401853 | 0.89 | MAPT (0.48) | MAPTRAB9ANPC1CYP1A2CYP3A4 | |
| SCHEMBL31192989 | 0.89 | MAPT (0.48) | MAPTRAB9ANPC1CYP1A2CYP3A4 | |
| SCHEMBL508145 | 0.87 | GPR3 (0.54) | MAPTRAB9ANPC1CYP1A2CYP3A4 | |
| SCHEMBL11208616 | 0.86 | MAPT (0.41) | MAPTRAB9ANPC1CYP1A2CYP3A4 | |
| SCHEMBL14562395 | 0.86 | MAOA (0.51) | MAPTRAB9ANPC1CYP1A2CYP3A4 | |
| SCHEMBL2419726 | 0.86 | MAPT (0.46) | MAPTRAB9ANPC1CYP1A2CYP3A4 | |
| SCHEMBL7943732 | 0.85 | MAPT (0.47) | MAPTRAB9ANPC1CYP1A2CYP3A4 | |
| SCHEMBL28791723 | 0.85 | MAPT (0.47) | MAPTRAB9ANPC1CYP1A2CYP3A4 | |
| SCHEMBL1042033 | 0.85 | MAPT (0.47) | MAPTRAB9ANPC1CYP1A2CYP3A4 | |
| SCHEMBL1554114 | 0.84 | MAPT (0.47) | MAPTRAB9ANPC1CYP1A2CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119798787-A | Mesoporous material compound, preparation method thereof, photosensitive resin composition and preparation method thereof | 上海信斯帝克新材料有限公司 | 2025-04-11 | — | — | CN | claimed |
| EP-2820073-B1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | ELECTRONICS FOR IMAGING INC (US) | 2018-09-05 | — | — | EP | claimed |
| CN-107674159-A | A kind of graft-modified polymers of chlorinated polyether and preparation method thereof | 宋宏婷 | 2018-02-09 | — | — | CN | claimed |
| US-9260616-B2 | Gloss-controllable, radiation-curable inkjet ink | ELECTRONICS FOR IMAGING, INC. (US) | 2016-02-16 | — | — | US | claimed |
| CN-104508025-A | Gloss-controllable, radiation-curable inkjet inks | ELECTRONICS FOR IMAGING INC | 2015-04-08 | — | — | CN | claimed |
| EP-2820073-A1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | Electronics for Imaging, Inc. (US) | 2015-01-07 | — | — | EP | claimed |
| WO-2013130618-A1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | ELECTRONICS FOR IMAGING, INC. (US) | 2013-09-06 | — | — | WO | claimed |
| US-20130222499-A1 | GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK | GLAS USA LLC [SUCCESSOR COLLATERAL AGENT] | 2013-08-29 | — | — | US | claimed |
| WO-2012028825-A1 | ULTRA-THIN FILMS OF MOLECULARLY IMPRINTED POLYMERS CONFINED TO THE SURFACE OF A SUBSTRATE | UNIVERSITE PARIS DIDEROT-PARIS 7 (FR) | 2012-03-08 | — | — | WO | claimed |
| WO-2007092935-A1 | HYDROXYALKYLAMINOALKYLTHIOXANTHONES | ALBEMARLE CORPORATION (US) | 2007-08-16 | — | — | WO | claimed |
| US-6815140-B2 | COMPRISING A NOVOLAC RESIN, A RADIATION-SENSITIVE QUINONEDIAZIDE COMPOUND, AND ALSO A THIOXANTHONE COMPOUND TO IMPROVE RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-09 | — | — | US | claimed |
| US-20020006574-A1 | Comprising a novolac resin, a radiation-sensitive quinonediazide compound, and also a thioxanthone compound to improve resolution | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | claimed |
| US-20010026905-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2001-10-04 | — | — | US | claimed |
| EP-0962826-A1 | A positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-12-08 | — | — | EP | claimed |
| EP-0160724-B1 | SEALING COMPOSITION, PROCESS FOR ITS PREPARATION, AND ITS USE | Kunststoff- & Lackfabrik Kemper (DE) | 1988-08-03 | — | — | EP | claimed |
| CN-120005445-A | Advertisement spray painting UV ink for PVC soft film and preparation method thereof | 珠海天威新材料股份有限公司 | 2025-05-16 | — | — | CN | disclosed |
| CN-119798787-A | Mesoporous material compound, preparation method thereof, photosensitive resin composition and preparation method thereof | 上海信斯帝克新材料有限公司 | 2025-04-11 | — | — | CN | disclosed |
| EP-0412570-A2 | Light- and heat-sensitive recording material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-02-13 | — | — | EP | disclosed |
| EP-0280295-A2 | A heat-resistant photosensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1988-08-31 | — | — | EP | disclosed |
| EP-0212238-A2 | Heat activatable adhesive for wire scribed circuits | Advanced Interconnection Technology, Inc. (US) | 1987-03-04 | — | — | EP | disclosed |