Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 3/20 | 0.92 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.92 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.80 |
| ▸ | TP53 | P04637 | 1/20 | 0.80 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.80 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.80 |
| ▸ | TSHR | P16473 | 1/20 | 0.80 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.80 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.80 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.80 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.80 |
| ▸ | DNM1 | Q05193 | 8/20 | 0.71 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL766127 | 1.00 | SLC22A1 (0.92) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL1063806 | 1.00 | SLC22A1 (0.92) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL964558 | 1.00 | SLC22A1 (0.92) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapentylammonium SCHEMBL9859800 | 1.00 | SLC22A1 (0.92) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrahexylammonium SCHEMBL2521928 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL13567361 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL4059060 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL1060273 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL158607 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL4059099 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12252632-B2 | Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method | ENTEGRIS, INC. (US) | 2025-03-18 | — | — | US | claimed |
| US-20220372329-A1 | CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD | ENTEGRIS, INC. | 2022-11-24 | — | — | US | claimed |
| EP-2863452-A1 | Battery separation layer comprising a quaternary ammonium fluorinated salt coating material | Samsung SDI Co., Ltd. (KR) | 2015-04-22 | — | — | EP | claimed |
| US-12252632-B2 | Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method | ENTEGRIS, INC. (US) | 2025-03-18 | — | — | US | disclosed |
| EP-3398983-B1 | POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS | SHINETSU CHEMICAL CO (JP) | 2023-09-27 | — | — | EP | disclosed |
| EP-4130878-A1 | ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK | FUJIFILM Corporation (JP) | 2023-02-08 | — | — | EP | disclosed |
| US-20220372329-A1 | CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD | ENTEGRIS, INC. | 2022-11-24 | — | — | US | disclosed |
| CN-114258421-A | Chemical mechanical polishing composition, cleaning composition, chemical mechanical polishing method and cleaning method | CMC材料株式会社 | 2022-03-29 | — | — | CN | disclosed |
| WO-2020156106-A1 | HETEROCYCLIC ARYL FORMAMIDES OR SALT THEREOF, PREPARATION METHOD, WEEDING COMPOSITION, AND APPLICATION | 青岛清原化合物有限公司 | 2020-08-06 | — | — | WO | disclosed |
| EP-2863452-A1 | Battery separation layer comprising a quaternary ammonium fluorinated salt coating material | Samsung SDI Co., Ltd. (KR) | 2015-04-22 | — | — | EP | disclosed |