Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A1 | O15245 | 3/20 | 0.92 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.92 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.80 |
| ▸ | TP53 | P04637 | 1/20 | 0.80 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.80 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.80 |
| ▸ | TSHR | P16473 | 1/20 | 0.80 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.80 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.80 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.80 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.80 |
| ▸ | DNM1 | Q05193 | 8/20 | 0.71 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1063806 | 1.00 | SLC22A1 (0.92) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL964558 | 1.00 | SLC22A1 (0.92) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrapentylammonium SCHEMBL9859800 | 1.00 | SLC22A1 (0.92) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL16649235 | 1.00 | SLC22A1 (0.92) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| Tetrahexylammonium SCHEMBL2521928 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL13567361 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL4059060 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL1060273 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL158607 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 | |
| SCHEMBL4059099 | 0.96 | SLC22A1 (0.93) | SLC22A1SLC22A2ALDH1A1TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1848824-A4 | SELECTED COMPACTION AGENTS AND METHODS AND COMPOSITIONS FOR BIOTECHNICAL SEPARATIONS | TECHNOLOGY LICENSING CO LLC (US) | 2008-07-09 | — | — | EP | claimed |
| EP-1848824-A1 | SELECTED COMPACTION AGENTS AND METHODS AND COMPOSITIONS FOR BIOTECHNICAL SEPARATIONS | Technology Licensing Co, Llc. (US) | 2007-10-31 | — | — | EP | claimed |
| WO-2006083962-A1 | SELECTED COMPACTION AGENTS AND METHODS AND COMPOSITIONS FOR BIOTECHNICAL SEPARATIONS | TECHNOLOGY LICENSING CO. LLC (US) | 2006-08-10 | — | — | WO | claimed |
| US-9275899-B2 | Chemical mechanical polishing composition and method for polishing tungsten | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2016-03-01 | — | — | US | disclosed |
| US-20150380295-A1 | CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD FOR POLISHING TUNGSTEN | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-12-31 | — | — | US | disclosed |
| US-8865013-B2 | Method for chemical mechanical polishing tungsten | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2014-10-21 | — | — | US | disclosed |
| US-8568610-B2 | Stabilized, concentratable chemical mechanical polishing composition and method of polishing a substrate | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2013-10-29 | — | — | US | disclosed |
| US-8513126-B2 | Slurry composition having tunable dielectric polishing selectivity and method of polishing a substrate | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2013-08-20 | — | — | US | disclosed |
| US-8440094-B1 | Method of polishing a substrate | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2013-05-14 | — | — | US | disclosed |
| US-8435420-B1 | Method of polishing using tunable polishing formulation | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2013-05-07 | — | — | US | disclosed |
| US-20130109182-A1 | Method Of Polishing Using Tunable Polishing Formulation | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2013-05-02 | — | — | US | disclosed |
| US-20120070990-A1 | Slurry Composition Having Tunable Dielectric Polishing Selectivity And Method Of Polishing A Substrate | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2012-03-22 | — | — | US | disclosed |
| US-20120070989-A1 | Stabilized, Concentratable Chemical Mechanical Polishing Composition And Method Of Polishing A Substrate | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2012-03-22 | — | — | US | disclosed |
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-7914965-B2 | Resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2011-03-29 | — | — | US | disclosed |
| US-7569347-B2 | Apparatus, methods and compositions for biotechnical separations | TECHNOLOGY LICENSING CO. LLC (US) | 2009-08-04 | — | — | US | disclosed |
| US-20060141521-A1 | Apparatus, methods and compositions for biotechnical separations | TECHNOLOGY LICENSING CO. LLC | 2006-06-29 | — | — | US | disclosed |
| US-5576459-A | Quaternary nitrogen or phosphorus chirates | SACHEM, INC. (US) | 1996-11-19 | — | — | US | disclosed |
| US-3966566-A | Electrolytic hydrodimerization process improvement | MONSANTO COMPANY (US) | 1976-06-29 | — | — | US | disclosed |
| US-3960679-A | Process for hydrodimerizing olefinic compounds | MONSANTO COMPANY (US) | 1976-06-01 | — | — | US | disclosed |