Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | CES1 | P23141 | 1/20 | 0.30 |
| ▸ | MAOA | P21397 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8719621 | 0.75 | SRD5A1 (0.37) | CES1MAOA | |
| SCHEMBL596017 | 0.70 | CA1 (0.37) | CA1CA2CES1MAOA | |
| SCHEMBL10446466 | 0.68 | TDP1 (0.35) | CYP2D6CYP2C19 | |
| SCHEMBL10702241 | 0.68 | CA1 (0.36) | CA1CA2CES1MAOA | |
| SCHEMBL9733032 | 0.68 | CA1 (0.40) | CA1CA2CES1MAOA | |
| SCHEMBL50865 | 0.68 | MAOA (0.50) | CA1CA2CES1MAOA | |
| SCHEMBL251162 | 0.68 | CA1 (0.36) | CA1CA2CES1MAOA | |
| SCHEMBL3743020 | 0.68 | CA1 (0.36) | CA1CA2CES1MAOA | |
| SCHEMBL30252635 | 0.68 | MAOA (0.50) | CA1CA2CES1MAOA | |
| SCHEMBL2943057 | 0.68 | CA1 (0.44) | CA1CA2CYP2D6CYP2C19CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0286708-A1 | Method of producing contact holes in a double insulation layer | International Business Machines Corporation (US) | 1988-10-19 | — | — | EP | claimed |
| EP-0273026-A2 | Solvents for Photoresist compositions | SHIPLEY COMPANY INC. (US) | 1988-06-29 | — | — | EP | claimed |
| EP-0085761-B1 | A POSITIVE RESIST COMPOSITION | International Business Machines Corporation (US) | 1986-08-20 | — | — | EP | claimed |
| EP-0085761-A1 | A positive resist composition | International Business Machines Corporation (US) | 1983-08-17 | — | — | EP | claimed |
| US-4397937-A | Positive resist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1983-08-09 | — | — | US | claimed |
| CN-119751320-A | Diazonaphthoquinone type photosensitive compound and application thereof in photoresist preparation | 湖北三峡实验室 | 2025-04-04 | — | — | CN | disclosed |
| CN-119431421-A | Compound with axial chirality or boron chirality BODIPYs and preparation method and application thereof | 中国医学科学院药用植物研究所 | 2025-02-14 | — | — | CN | disclosed |
| CN-118786371-A | Identification medium and article | 日本瑞翁株式会社 | 2024-10-15 | — | — | CN | disclosed |
| CN-114805171-B | N-aryl indole compound and synthesis method thereof | 河南师范大学 | 2023-08-04 | — | — | CN | disclosed |
| CN-114805171-B | N-aryl indole compound and synthesis method thereof | 河南师范大学 | 2023-08-04 | — | — | CN | disclosed |
| CN-113461943-B | Copolymerized aryl ether sulfone containing bis-phthalazinone structure and preparation method thereof | 大连理工大学 | 2022-05-31 | — | — | CN | disclosed |
| CN-114502695-A | Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element | 日产化学株式会社 | 2022-05-13 | — | — | CN | disclosed |
| US-4552830-A | UNSATURATED COMPOUND, FREE RADICAL-PRODUCING PHOTOINITIATOR FLUORA COLOR FORMER, PROTON DONOR | DYNACHEM CORPORATION (US) | 1985-11-12 | — | — | US | disclosed |
| EP-0147596-A2 | A positive lithographic resist composition | International Business Machines Corporation (US) | 1985-07-10 | — | — | EP | disclosed |
| US-4343885-A | PHOTORESISTS | DYNACHEM CORPORATION (US) | 1982-08-10 | — | — | US | disclosed |
| EP-0005380-B1 | PHOTOTROPIC PHOTOSENSITIVE COMPOSITIONS CONTAINING A FLUORAN COLORFORMER | Dynachem Corporation (US) | 1982-01-06 | — | — | EP | disclosed |
| EP-0005379-B1 | PHOTOSENSITIVE COMPOSITIONS CONTAINING CARBONYLIC HALIDES AS ACTIVATORS | Dynachem Corporation (US) | 1981-12-23 | — | — | EP | disclosed |
| EP-0005379-A2 | Photosensitive compositions containing carbonylic halides as activators | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| EP-0005380-A2 | Phototropic photosensitive compositions containing a fluoran colorformer | Dynachem Corporation (US) | 1979-11-14 | — | — | EP | disclosed |
| US-4152158-A | Electrochemically treated photo-lithographic plates | POLYCHROME CORPORATION (US) | 1979-05-01 | — | — | US | disclosed |