SCHEMBL16660495

SCHEMBL16660495

C=C(Cc1ccc(OC(C)(C)C)c2ccccc12)C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.40
HIF1A Q16665 1/20 0.40
KDM4E B2RXH2 3/20 0.38
ALDH1A1 P00352 3/20 0.38
HSD17B10 Q99714 1/20 0.38
KMT2A Q03164 4/20 0.38
MEN1 O00255 3/20 0.38
ATM Q13315 2/20 0.38
ELANE P08246 1/20 0.35
SLC2A1 P11166 2/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
PKM P14618 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
FFAR4 Q5NUL3 1/20 0.33
LMNA P02545 1/20 0.33
TSHR P16473 1/20 0.33
NPSR1 Q6W5P4 1/20 0.32
FABP4 P15090 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3422965 0.82 TDP1 (0.46) CYP2C9HIF1AKDM4EALDH1A1KMT2A
SCHEMBL19843856 0.77 CYP2C9 (0.39) CYP2C9HIF1AKDM4EALDH1A1HSD17B10
SCHEMBL3423766 0.75 TDP1 (0.50) KDM4EALDH1A1KMT2AMEN1ATM
SCHEMBL2192625 0.74 IDO1 (0.45) KDM4EALDH1A1HSD17B10KMT2AMEN1
SCHEMBL31604997 0.74 IDO1 (0.45) KDM4EALDH1A1HSD17B10KMT2AMEN1
SCHEMBL3822398 0.73 IDO1 (0.41) KDM4EALDH1A1HSD17B10SMN1; SMN2PKM
SCHEMBL27822312 0.71 CDC25B (0.54) CYP2C9HIF1AKDM4EALDH1A1HSD17B10
SCHEMBL30823261 0.70 ALDH1A1 (0.42) CYP2C9KDM4EALDH1A1SMN1; SMN2TDP1
SCHEMBL25274876 0.70 PPARA (0.43) CYP2C9KMT2AFFAR4
Methacrylic Acid SCHEMBL16660496 0.70 ALDH1A1 (0.63) CYP2C9KDM4EALDH1A1HSD17B10KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed