SCHEMBL1666285

SCHEMBL1666285

[c]1[c]cc2ncc3ccccc3c2[c]1

nearest known ligand 0.48

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.48
GPR3 P46089 1/20 0.48
NPC1 O15118 1/20 0.33
LMNA P02545 1/20 0.33
MAPT P10636 1/20 0.33
RECQL P46063 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CYP1A2 P05177 2/20 0.32
CYP3A4 P08684 1/20 0.31
TOP2A P11388 1/20 0.30
ADORA3 P0DMS8 1/20 0.30
MAPK1 P28482 1/20 0.30
ALDH1A1 P00352 1/20 0.30
PARP1 P09874 1/20 0.30
PRKCI P41743 1/20 0.30
PDE4B Q07343 1/20 0.30
HSD17B10 Q99714 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1395938 0.77 KDM4E (0.50) KDM4EGPR3NPC1LMNAMAPT
SCHEMBL4408 0.68 KDM4E (0.57) KDM4EGPR3NPC1LMNAMAPT
SCHEMBL15578201 0.67 KDM4E (0.50) KDM4EGPR3NPC1LMNAMAPT
SCHEMBL15578380 0.67 KDM4E (0.50) KDM4EGPR3NPC1LMNAMAPT
Phenanthridine SCHEMBL9106884 0.66 GPR3 (1.00) KDM4EGPR3NPC1LMNAMAPT
Phenanthridine SCHEMBL30823553 0.66 GPR3 (1.00) KDM4EGPR3NPC1LMNAMAPT
Phenanthridine SCHEMBL30914262 0.66 GPR3 (1.00) KDM4EGPR3NPC1LMNAMAPT
Phenanthridine SCHEMBL8666 0.66 GPR3 (1.00) KDM4EGPR3NPC1LMNAMAPT
SCHEMBL18317732 0.66 GPR3 (0.48) KDM4EGPR3NPC1LMNAMAPT
Phenanthridine SCHEMBL23003530 0.65 GPR3 (0.95) KDM4EGPR3NPC1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2311918-B1 Ink composition, and inkjet recording method FUJIFILM CORP (JP) 2014-10-22 EP disclosed
US-8211508-B2 radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; cyclic monofunctional acrylic or N-vinyl monomers FUJIFILM CORPORATION (JP) 2012-07-03 US disclosed
EP-2311918-A1 Ink composition, and inkjet recording method FUJIFILM Corporation (JP) 2011-04-20 EP disclosed
US-20080075882-A1 PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2008-03-27 US disclosed