SCHEMBL1666447

SCHEMBL1666447

COC(=O)c1cccc(C(=O)O)c1C(=O)O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.52
LMNA P02545 1/20 0.52
CA1 P00915 3/20 0.50
CA2 P00918 3/20 0.50
CA9 Q16790 3/20 0.50
CA12 O43570 2/20 0.50
CA7 P43166 2/20 0.50
CA14 Q9ULX7 2/20 0.50
HSD17B10 Q99714 2/20 0.50
ALDH1A1 P00352 2/20 0.50
CFTR P13569 1/20 0.50
ALOX15 P16050 2/20 0.49
MAPT P10636 1/20 0.49
KDM4E B2RXH2 2/20 0.48
POLB P06746 1/20 0.48
ATM Q13315 1/20 0.48
SLC6A3 Q01959 1/20 0.47
HPGD P15428 1/20 0.46
CA5A P35218 1/20 0.44
KMT2A Q03164 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8669430 0.96 TSHR (0.55) TSHRLMNACA1CA2CA9
SCHEMBL8669428 0.92 CA1 (0.55) TSHRLMNACA1CA2CA9
SCHEMBL31514070 0.88 CA12 (0.59) TSHRLMNACA1CA2CA9
SCHEMBL28059998 0.88 CA12 (0.47) TSHRLMNACA1CA2CA9
SCHEMBL27589842 0.87 ALDH1A1 (0.50) TSHRLMNACA1CA2CA9
SCHEMBL27459614 0.87 TSHR (0.47) TSHRLMNACA1CA2CA9
SCHEMBL27688915 0.85 TSHR (0.46) TSHRLMNACA1CA2CA9
SCHEMBL8156698 0.85 NR4A2 (0.49) TSHRLMNACA1CA2CA9
SCHEMBL30995708 0.85 CA1 (0.68) TSHRLMNACA1CA2CA9
SCHEMBL10425360 0.84 CA12 (0.55) TSHRLMNACA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114639552-A Electrode material for enhancing capacitive energy by utilizing sunlight irradiation and preparation method thereof 东北大学 2022-06-17 CN claimed
CN-107250214-B Method for producing aromatic polyimide 罗地亚经营管理公司 2019-11-12 CN claimed
CN-107649135-A Load type metal catalyst and preparation method and application 太原理工大学 2018-02-02 CN claimed
CN-107250214-A method for producing aromatic polyimide 罗地亚经营管理公司 2017-10-13 CN claimed
CN-114639552-A Electrode material for enhancing capacitive energy by utilizing sunlight irradiation and preparation method thereof 东北大学 2022-06-17 CN disclosed
CN-107649135-A Load type metal catalyst and preparation method and application 太原理工大学 2018-02-02 CN disclosed
CN-107636044-A method for producing aromatic polyimide 罗地亚经营管理公司 2018-01-26 CN disclosed
CN-107074725-A Benzene polycarboxylic acid and its improvement method for hydrogenation of derivative 埃克森美孚化学专利公司 2017-08-18 CN disclosed
CN-106350892-B Anti-flaming tricot lace fabric and production method thereof 福建省百凯经编实业有限公司 2017-05-10 CN disclosed
CN-106350892-A Anti-flaming tricot lace fabric and production method thereof 福建省百凯经编实业有限公司 2017-01-25 CN disclosed
EP-1830228-B1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2015-08-05 EP disclosed
CN-104203970-A Liquid crystal aligning agent WAKO PURE CHEM IND LTD 2014-12-10 CN disclosed
EP-2662727-A2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-11-13 EP disclosed
US-8350096-B2 Compound for resist and radiation-sensitive composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-08 US disclosed
US-20130004896-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION SPECIFICATION ECHIGO MASATOSHI (JP) 2013-01-03 US disclosed
US-20110165516-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION ECHIGO MASATOSHI 2011-07-07 US disclosed
US-7919223-B2 Polyphenol compound synthesized by condensation between aromatic ketone or aldehyde and a phenol; acid-amplified, non-polymeric resist; highly sensitive to KrF excimer lasers, extreme ultraviolet rays, electron beams, X-rays; resist patterns with high resolution, high heat, etch resistance MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2011-04-05 US disclosed
US-20080113294-A1 Compound for Resist and Radiation-Sensitive Composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-05-15 US disclosed
EP-1830228-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-09-05 EP disclosed
CN-1531459-A With Ru/SiO2Method for hydrogenating organic compounds with a catalyst �����ɷ� 2004-09-22 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110165516-A1 COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION XRCC6, XRCC5, KISS1R TSHR 3014/4885LMNA 1146/4885CA1 2338/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.