SCHEMBL1666473

SCHEMBL1666473

C=C1C=CC(=O)OC1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Maleic Anhydride SCHEMBL28117971 0.73 ALOX15 (0.37)
SCHEMBL1696742 0.73 HSP90AA1 (0.32)
SCHEMBL6651007 0.72
Maleic Anhydride SCHEMBL10625748 0.72 ALDH1A1 (0.34)
Maleic Anhydride SCHEMBL55173 0.72
Maleic Anhydride SCHEMBL5638360 0.72 ALOX15 (0.39)
Maleic Anhydride SCHEMBL1332543 0.71
SCHEMBL10426127 0.71 ALDH1A1 (0.37)
Maleic Anhydride SCHEMBL10482080 0.71 ALDH1A1 (0.37)
Maleic Anhydride SCHEMBL1332547 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7585612-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2009-09-08 US claimed
EP-1742108-B1 Coating compositions for use with an overcoated photoresist ROHM & HAAS ELECT MAT (US) 2015-10-28 EP disclosed
US-7919222-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) 2011-04-05 US disclosed
US-7585612-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2009-09-08 US disclosed
US-20070178406-A1 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-08-02 US disclosed
EP-1813986-A2 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2007-08-01 EP disclosed
US-20070042289-A1 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-02-22 US disclosed
EP-1742108-A1 Coating compositions for use with an overcoated photoresist Rohm and Haas Electronic Materials, L.L.C. (US) 2007-01-10 EP disclosed