SCHEMBL16674862

SCHEMBL16674862

O=C(Nc1c(I)c(C(=O)O)c(I)c(C(=O)O)c1I)c1cc(C(=O)Nc2c(I)c(C(=O)O)c(I)c(C(=O)O)c2I)cc(C(=O)Nc2c(I)c(C(=O)O)c(I)c(C(=O)O)c2I)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 1/20 0.42
▸ MAPK1 P28482 1/20 0.42
▸ LMNA P02545 3/20 0.41
▸ MEN1 O00255 8/20 0.39
▸ KMT2A Q03164 8/20 0.39
▸ PKM P14618 3/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.38
▸ TPMT P51580 1/20 0.38
▸ MAPT P10636 2/20 0.37
▸ TDP1 Q9NUW8 2/20 0.37
▸ GRIK1 P39086 1/20 0.37
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.35
▸ HTT P42858 1/20 0.35
▸ GFER P55789 1/20 0.35
▸ TOP1 P11387 1/20 0.34
▸ TOP2A P11388 1/20 0.34
▸ TOP2B Q02880 1/20 0.34
▸ NPC1 O15118 1/20 0.34
▸ ACLY P53396 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16674863 0.80 MAPT (0.41) TSHRMAPK1LMNAMEN1KMT2A
SCHEMBL8752140 0.74 LMNA (0.67) TSHRMAPK1LMNAMEN1KMT2A
Hydrochloric Acid SCHEMBL8089018 0.72 LMNA (0.65) TSHRMAPK1LMNAMEN1KMT2A
SCHEMBL14275457 0.72 TPMT (0.67) TSHRMAPK1MEN1KMT2APKM
SCHEMBL4587818 0.71 TPMT (0.41) TSHRMAPK1LMNAMEN1KMT2A
SCHEMBL11387512 0.71 TSHR (0.47) TSHRMAPK1LMNASMN1; SMN2
SCHEMBL8727104 0.71 TSHR (0.47) TSHRMAPK1LMNASMN1; SMN2
SCHEMBL22314641 0.70 LMNA (0.41) TSHRMAPK1LMNATPMTSMN1; SMN2
Diatrizoic Acid SCHEMBL7615048 0.69 LMNA (0.67) TSHRMAPK1LMNAMEN1KMT2A
Diatrizoic Acid SCHEMBL8508 0.69 LMNA (0.67) TSHRMAPK1LMNAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9328198-B2 Composition for forming resist underlayer AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2016-05-03 — — US disclosed
US-20150118624-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2015-04-30 — — US disclosed
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