SCHEMBL16674863

SCHEMBL16674863

COC(=O)c1c(I)c(NC(=O)c2cc(C(=O)Nc3c(I)c(C(=O)OC)c(I)c(C(=O)OC)c3I)cc(C(=O)Nc3c(I)c(C(=O)OC)c(I)c(C(=O)OC)c3I)c2)c(I)c(C(=O)OC)c1I

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 3/20 0.41
▸ KDM4E B2RXH2 6/20 0.40
▸ ALDH1A1 P00352 5/20 0.40
▸ GAA P10253 2/20 0.40
▸ HSD17B10 Q99714 2/20 0.40
▸ HTT P42858 1/20 0.40
▸ TSHR P16473 1/20 0.40
▸ PTPN11 Q06124 1/20 0.40
▸ HPGD P15428 4/20 0.39
▸ POLB P06746 3/20 0.39
▸ LMNA P02545 2/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ MAPK1 P28482 2/20 0.38
▸ RAB9A P51151 1/20 0.37
▸ KMT2A Q03164 2/20 0.37
▸ MEN1 O00255 1/20 0.37
▸ CISD2 Q8N5K1 1/20 0.37
▸ CA12 O43570 1/20 0.36
▸ CA1 P00915 1/20 0.36
▸ CA2 P00918 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16674862 0.80 TSHR (0.42) MAPTALDH1A1HTTTSHRLMNA
SCHEMBL9852541 0.74 LMNA (0.61) MAPTKDM4EALDH1A1HPGDLMNA
SCHEMBL11684908 0.72 CA1 (0.48) MAPTKDM4EALDH1A1GAAHSD17B10
SCHEMBL3403381 0.69 CA12 (0.46) KDM4EALDH1A1GAATSHRHPGD
SCHEMBL6243144 0.68 KDM4E (0.72) MAPTKDM4EALDH1A1HSD17B10HTT
SCHEMBL11168943 0.68 LMNA (0.49) MAPTKDM4EALDH1A1GAAHSD17B10
SCHEMBL28367227 0.67 CA12 (0.40) MAPTKDM4EALDH1A1GAAHSD17B10
SCHEMBL28774875 0.67 LMNA (0.43) MAPTKDM4EALDH1A1HSD17B10HTT
SCHEMBL11713096 0.67 TSHR (0.41) MAPTKDM4EALDH1A1GAAHSD17B10
SCHEMBL6243177 0.66 NPC1 (0.72) MAPTKDM4EALDH1A1HSD17B10HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9328198-B2 Composition for forming resist underlayer AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2016-05-03 — — US disclosed
US-20150118624-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER AZ ELECTRONIC MATERIALS S.À R.L. (LU) 2015-04-30 — — US disclosed
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