Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BCHE | P06276 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | DUT | P33316 | 3/20 | 0.34 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.33 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.33 |
| ▸ | PDE4A | P27815 | 1/20 | 0.33 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.33 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.33 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15945466 | 0.86 | ALDH1A1 (0.38) | SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL17175303 | 0.84 | ALDH1A1 (0.39) | SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL16081326 | 0.84 | FFAR1 (0.34) | POLBDUT | |
| SCHEMBL14667769 | 0.84 | PDE4A (0.42) | BCHEPDE4A | |
| SCHEMBL16247805 | 0.84 | BCHE (0.38) | BCHEPOLBDUTHDAC4HDAC2 | |
| SCHEMBL6721652 | 0.83 | BCHE (0.40) | BCHEPOLBDUTHDAC4HDAC2 | |
| SCHEMBL16683116 | 0.77 | ALDH1A1 (0.36) | — | |
| SCHEMBL10182805 | 0.77 | POLB (0.36) | POLBHDAC4HDAC2HDAC8SLC6A2 | |
| SCHEMBL18713484 | 0.76 | DUT (0.46) | DUTHDAC4HDAC2HDAC8PDE4A | |
| SCHEMBL16865924 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150293446-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-15 | — | — | US | disclosed |
| US-20150118628-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |