SCHEMBL16683084

SCHEMBL16683084

CCC(C)c1ccc(OP)c(OP)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.46
GAA P10253 2/20 0.46
USP2 O75604 1/20 0.46
PKM P14618 1/20 0.46
HPGD P15428 1/20 0.46
ALOX15 P16050 1/20 0.46
HSD17B10 Q99714 1/20 0.46
MAPT P10636 2/20 0.41
LMNA P02545 2/20 0.41
TP53 P04637 1/20 0.41
ALOX12 P18054 1/20 0.41
HDAC4 P56524 1/20 0.40
HDAC2 Q92769 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
TSHR P16473 2/20 0.39
SCN10A Q9Y5Y9 1/20 0.37
CYP2C9 P11712 1/20 0.35
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
ACHE P22303 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL858472 0.83 ALDH1A1 (0.39) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL8298141 0.78 ALDH1A1 (0.60) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL10183538 0.74 ALDH1A1 (0.41) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL10182749 0.73 ALDH1A1 (0.43) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL9963706 0.73 ALDH1A1 (0.49) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL15219451 0.73 ALDH1A1 (0.43) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL598140 0.72 ALDH1A1 (0.52) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL24780244 0.72 ALDH1A1 (0.51) ALDH1A1GAAUSP2PKMHPGD
SCHEMBL23130388 0.72 MAPT (0.54) ALDH1A1GAAMAPTLMNATP53
SCHEMBL18713515 0.72 ALDH1A1 (0.48) ALDH1A1GAAUSP2PKMHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150293446-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-10-15 US disclosed
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed