SCHEMBL16684201

SCHEMBL16684201

CC(C)(C)OC(=O)C(C)(C)C(F)(F)F

nearest known ligand 0.46

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.46
CA14 Q9ULX7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9416843 0.79 DGAT1 (0.46) DGAT1CA14
SCHEMBL12018690 0.79 DGAT1 (0.46) DGAT1CA14
SCHEMBL14213166 0.78 DGAT1 (0.50) DGAT1CA14
SCHEMBL1714208 0.78 DGAT1 (0.50) DGAT1CA14
SCHEMBL14049156 0.78 DGAT1 (0.50) DGAT1CA14
SCHEMBL22296098 0.78 DGAT1 (0.50) DGAT1CA14
SCHEMBL24177935 0.77 DGAT1 (0.44) DGAT1
Hydrochloric Acid SCHEMBL28000852 0.76 DGAT1 (0.48) DGAT1CA14
SCHEMBL776194 0.76 DGAT1 (0.42) DGAT1
SCHEMBL17772557 0.75 DGAT1 (0.43) DGAT1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4129975-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, RESIST FILM, AND ELECTRONIC DEVICE PRODUCTION METHOD FUJIFILM Corporation (JP) 2023-02-08 EP disclosed
US-20150118628-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed