Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 1.00 |
| ▸ | HIF1A | Q16665 | 2/20 | 1.00 |
| ▸ | MANBA | O00462 | 1/20 | 1.00 |
| ▸ | THRB | P10828 | 1/20 | 1.00 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.64 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.56 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.56 |
| ▸ | IDUA | P35475 | 1/20 | 0.56 |
| ▸ | GUSB | P08236 | 1/20 | 0.56 |
| ▸ | GBA1 | P04062 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14391479 | 1.00 | LMNA (1.00) | LMNAHIF1AMANBATHRBCYP2C19 | |
| SCHEMBL14296856 | 1.00 | LMNA (1.00) | LMNAHIF1AMANBATHRBCYP2C19 | |
| SCHEMBL12216738 | 1.00 | LMNA (1.00) | LMNAHIF1AMANBATHRBCYP2C19 | |
| SCHEMBL25070350 | 1.00 | LMNA (1.00) | LMNAHIF1AMANBATHRBCYP2C19 | |
| SCHEMBL19638526 | 1.00 | LMNA (1.00) | LMNAHIF1AMANBATHRBCYP2C19 | |
| SCHEMBL23111379 | 1.00 | LMNA (1.00) | LMNAHIF1AMANBATHRBCYP2C19 | |
| SCHEMBL8079451 | 1.00 | LMNA (1.00) | LMNAHIF1AMANBATHRBCYP2C19 | |
| SCHEMBL23532013 | 1.00 | LMNA (1.00) | LMNAHIF1AMANBATHRBCYP2C19 | |
| SCHEMBL1893475 | 1.00 | LMNA (1.00) | LMNAHIF1AMANBATHRBCYP2C19 | |
| SCHEMBL17017514 | 1.00 | LMNA (1.00) | LMNAHIF1AMANBATHRBCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9022834-B2 | Polishing solution for CMP and polishing method using the polishing solution | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-05-05 | — | — | US | disclosed |