SCHEMBL16690184

SCHEMBL16690184

CCCC(=O)O/N=C(/CC)C(=O)c1ccc(-c2ccc([N+](=O)[O-])cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
BCL9 O00512 1/20 0.50
CTNNB1 P35222 1/20 0.50
MAPT P10636 11/20 0.45
KMT2A Q03164 5/20 0.45
ALDH1A1 P00352 5/20 0.45
MEN1 O00255 2/20 0.45
CES1 P23141 2/20 0.44
POLB P06746 4/20 0.41
MAPK1 P28482 1/20 0.41
SMN1; SMN2 Q16637 3/20 0.41
HDAC3 O15379 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC2 Q92769 1/20 0.41
CES2 O00748 1/20 0.40
GAA P10253 1/20 0.40
LMNA P02545 1/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
HTT P42858 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16690273 0.93 MAPT (0.48) BCL9CTNNB1MAPTKMT2AALDH1A1
SCHEMBL16690168 0.87 ALDH1A1 (0.41) BCL9CTNNB1MAPTKMT2AALDH1A1
SCHEMBL16690195 0.87 BCL9 (0.51) BCL9CTNNB1MAPTKMT2AALDH1A1
SCHEMBL16690223 0.86 CES1 (0.47) MAPTKMT2AALDH1A1MEN1CES1
SCHEMBL16690230 0.85 ALDH1A1 (0.46) BCL9CTNNB1MAPTKMT2AALDH1A1
SCHEMBL16690157 0.84 BCL9 (0.53) BCL9CTNNB1MAPTKMT2AALDH1A1
SCHEMBL16690185 0.83 ALDH1A1 (0.41) BCL9CTNNB1MAPTKMT2AALDH1A1
SCHEMBL16690189 0.83 MAPT (0.50) BCL9CTNNB1MAPTKMT2AALDH1A1
SCHEMBL16690266 0.82 CES2 (0.52) MAPTKMT2AALDH1A1MEN1CES1
SCHEMBL16690177 0.80 ALDH1A1 (0.53) BCL9CTNNB1MAPTKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2015064958-A1 NOVEL OXIME ESTER BIPHENYL COMPOUND, PHOTO INITIATOR AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME 한국화학연구원 2015-05-07 WO disclosed