SCHEMBL16690239

SCHEMBL16690239

CC(=O)O/N=C(\c1ccccc1)c1ccc(-c2ccc([N+](=O)[O-])cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 2/20 0.56
POLB P06746 2/20 0.56
CES2 O00748 1/20 0.53
CES1 P23141 1/20 0.53
KMT2A Q03164 7/20 0.51
ALDH1A1 P00352 2/20 0.51
TDP1 Q9NUW8 2/20 0.51
LMNA P02545 1/20 0.51
SMN1; SMN2 Q16637 3/20 0.48
NPC1 O15118 3/20 0.46
RAB9A P51151 3/20 0.46
MAPT P10636 5/20 0.45
NQO2 P16083 1/20 0.45
MEN1 O00255 4/20 0.44
TSHR P16473 1/20 0.44
CYP1A2 P05177 1/20 0.44
CYP3A4 P08684 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
AHR P35869 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27852524 0.90 MAPK1 (0.58) MAPK1CES2CES1KMT2AALDH1A1
SCHEMBL16690141 0.86 CES1 (0.56) MAPK1POLBCES2CES1KMT2A
SCHEMBL16690246 0.86 CES2 (0.45) MAPK1POLBCES2CES1KMT2A
SCHEMBL16690245 0.83 ALDH1A1 (0.51) MAPK1CES2CES1KMT2AALDH1A1
SCHEMBL16690170 0.83 MAPK1 (0.53) MAPK1POLBCES1KMT2AALDH1A1
SCHEMBL16690221 0.81 CES1 (0.53) MAPK1POLBCES2CES1KMT2A
SCHEMBL213829 0.81 ALDH1A1 (0.51) MAPK1POLBCES2CES1KMT2A
SCHEMBL22985750 0.80 ALDH1A1 (0.41) POLBCES2CES1KMT2AALDH1A1
SCHEMBL17973538 0.80 MAPK1 (0.49) MAPK1POLBCES1KMT2AALDH1A1
SCHEMBL27852827 0.79 ALDH1A1 (0.62) POLBCES2CES1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2015064958-A1 NOVEL OXIME ESTER BIPHENYL COMPOUND, PHOTO INITIATOR AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME 한국화학연구원 2015-05-07 WO disclosed