Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30176793 | 0.95 | ALDH1A1 (0.39) | ALDH1A1MEN1CYP1A2CYP3A4CYP2D6 | |
| SCHEMBL30042650 | 0.94 | MEN1 (0.33) | ALDH1A1MEN1CYP1A2CYP3A4CYP2D6 | |
| SCHEMBL22129632 | 0.94 | — | — | |
| SCHEMBL458198 | 0.94 | MEN1 (0.33) | ALDH1A1MEN1CYP1A2CYP3A4CYP2D6 | |
| SCHEMBL9986237 | 0.94 | — | — | |
| SCHEMBL29759000 | 0.94 | MEN1 (0.33) | ALDH1A1MEN1CYP1A2CYP3A4CYP2D6 | |
| SCHEMBL27939 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL1500396 | 0.89 | — | — | |
| Bromide SCHEMBL28697043 | 0.89 | — | — | |
| SCHEMBL2991559 | 0.87 | ALDH1A1 (0.67) | ALDH1A1MEN1CYP2D6KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122070173-A | Microfluidic system, reaction method using microfluidic system, and method for producing polymer | 株式会社大赛璐 | 2026-05-19 | — | — | CN | disclosed |
| US-12498638-B2 | Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method | DAICEL CORPORATION (JP) | 2025-12-16 | — | — | US | disclosed |
| US-12461443-B2 | Photoresist resin, method for producing photoresist resin, photoresist resin composition, and method for forming pattern | DAICEL CORPORATION (JP) | 2025-11-04 | — | — | US | disclosed |
| WO-2025079622-A1 | MICROFLUIDIC SYSTEM, REACTION METHOD USING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER | 株式会社ダイセル | 2025-04-17 | — | — | WO | disclosed |
| WO-2025079618-A1 | MICROFLUIDIC SYSTEM, REACTION METHOD FOR EMPLOYING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER | 株式会社ダイセル | 2025-04-17 | — | — | WO | disclosed |
| WO-2025079624-A1 | METHOD FOR PRODUCING POLYMER | 株式会社ダイセル | 2025-04-17 | — | — | WO | disclosed |
| WO-2025079623-A1 | METHOD FOR PRODUCING POLYMER | 株式会社ダイセル | 2025-04-17 | — | — | WO | disclosed |
| WO-2025079620-A1 | MICROFLUIDIC SYSTEM, PROCESSING METHOD USING MICROFLUIDIC SYSTEM, AND METHOD FOR PRODUCING POLYMER | 株式会社ダイセル | 2025-04-17 | — | — | WO | disclosed |
| US-20240084047-A1 | METHOD FOR MANUFACTURING POLYMER | DAICEL CORPORATION (JP) | 2024-03-14 | — | — | US | disclosed |
| US-11859028-B2 | Method for manufacturing polymer | DAICEL CORPORATION (JP) | 2024-01-02 | — | — | US | disclosed |
| US-20220372188-A1 | PHOTORESIST RESIN, METHOD FOR PRODUCING PHOTORESIST RESIN, PHOTORESIST RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN | DAICEL CORPORATION (JP) | 2022-11-24 | — | — | US | disclosed |
| WO-2022210596-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, COLOR FILTER, AND MEMBER FOR DISPLAY DEVICE OR DISPLAY DEVICE | 株式会社ダイセル | 2022-10-06 | — | — | WO | disclosed |
| US-11434308-B2 | Method for manufacturing polymer | DAICEL CORPORATION (JP) | 2022-09-06 | — | — | US | disclosed |
| US-20220267494-A1 | MONOMER, RESIN FOR PHOTORESIST, RESIN COMPOSITION FOR PHOTORESIST, AND PATTERN FORMING METHOD | DAICEL CORPORATION (JP) | 2022-08-25 | — | — | US | disclosed |
| US-20220259335-A1 | METHOD FOR MANUFACTURING POLYMER | DAICEL CORPORATION (JP) | 2022-08-18 | — | — | US | disclosed |
| US-9778567-B2 | Resist composition, method of forming resist pattern, polymeric compound, compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-03 | — | — | US | disclosed |
| US-20150140497-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12498638-B2 | Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method | ELOB, COPE, COPB1 | ALDH1A1 1352/4885MEN1 4859/4885CYP1A2 1519/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.