SCHEMBL1671877

SCHEMBL1671877

O=C(OC(C(F)(F)F)C(F)(F)S(=O)(=O)[O-])c1ccccc1.Oc1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.39
ESR2 Q92731 2/20 0.39
TP53 P04637 1/20 0.35
TSHR P16473 1/20 0.35
LMNA P02545 1/20 0.35
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA7 P43166 1/20 0.34
CA9 Q16790 1/20 0.34
CA14 Q9ULX7 1/20 0.34
KMT2A Q03164 2/20 0.34
MIF P14174 1/20 0.32
PRKCA P17252 1/20 0.32
MAPK1 P28482 1/20 0.31
HIF1A Q16665 1/20 0.31
SLC6A2 P23975 1/20 0.31
SLC6A3 Q01959 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CES2 O00748 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL246106 0.94 TSHR (0.39) ESR1ESR2TP53TSHRLMNA
SCHEMBL547364 0.88 MAPT (0.41) TP53TSHRLMNAKMT2APRKCA
SCHEMBL1671636 0.87 PDCD1 (0.44) ESR1ESR2TP53TSHRCA12
SCHEMBL1673158 0.86 KMT2A (0.33) TP53TSHRKMT2ATDP1ALDH1A1
SCHEMBL482457 0.85 TSHR (0.44) ESR1ESR2TP53TSHRLMNA
SCHEMBL2283826 0.84 ESR2 (0.32) ESR1ESR2
SCHEMBL1672501 0.84 ELANE (0.45) KMT2ATDP1ALDH1A1
SCHEMBL1320589 0.84 TDP1 (0.31) TP53TSHRKMT2APRKCATDP1
SCHEMBL546422 0.82 GABRB1 (0.40) CA12CA1CA2CA9TDP1
SCHEMBL482783 0.82 ALDH1A1 (0.33) TSHRLMNAKMT2AALDH1A1MGLL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1710230-B1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-14 EP disclosed
US-7919226-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-05 US disclosed
US-7511169-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-31 US disclosed
US-20080318160-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process RITTAL GMBH & CO. KG (DE) 2008-12-25 US disclosed
US-20060228648-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2006-10-12 US disclosed
EP-1710230-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2006-10-11 EP disclosed