SCHEMBL1671972

SCHEMBL1671972

CC(C)(C)c1ccc(C(=O)OC(C(F)(F)F)C(F)(F)S(=O)(=O)O)cc1.[NaH]

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPV1 Q8NER1 3/20 0.40
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
MAPT P10636 2/20 0.39
TDP1 Q9NUW8 2/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
HDAC1 Q13547 1/20 0.38
TNF P01375 1/20 0.38
KLF5 Q13887 1/20 0.38
NOD1 Q9Y239 1/20 0.38
EPHX2 P34913 1/20 0.38
NR1H4 Q96RI1 1/20 0.38
CA1 P00915 3/20 0.37
CA2 P00918 3/20 0.37
SRD5A2 P31213 1/20 0.37
PRSS1 P07477 1/20 0.36
ACR P10323 1/20 0.36
ALDH1A1 P00352 2/20 0.36
RECQL P46063 2/20 0.36
NPC1 O15118 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL383521 0.99 TRPV1 (0.41) TRPV1MEN1KMT2AMAPTTDP1
SCHEMBL17195514 0.87 CA1 (0.37) MEN1KMT2AMAPTCA1CA2
SCHEMBL18785970 0.87 CES2 (0.44) TRPV1MEN1KMT2AMAPTCA1
SCHEMBL1671971 0.86 MEN1 (0.39) TRPV1MEN1KMT2AMAPTTDP1
SCHEMBL18785777 0.85 PDCD1 (0.38) MEN1KMT2AMAPTTDP1L3MBTL1
SCHEMBL18785299 0.84 ACHE (0.35) TRPV1MEN1KMT2AMAPTTDP1
SCHEMBL11991259 0.84 MEN1 (0.43) TRPV1MEN1KMT2AMAPTTDP1
SCHEMBL18785982 0.84 TDP1 (0.43) MEN1KMT2AMAPTTDP1L3MBTL1
SCHEMBL1656566 0.83 MEN1 (0.38) MEN1KMT2AALDH1A1RAB9ALMNA
SCHEMBL20008852 0.83 CA12 (0.34) MEN1KMT2AMAPTTDP1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1710230-B1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-14 EP disclosed
US-7919226-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-05 US disclosed
US-7514202-B2 Thermal acid generator, resist undercoat material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-04-07 US disclosed
US-7511169-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-31 US disclosed
US-20080318160-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process RITTAL GMBH & CO. KG (DE) 2008-12-25 US disclosed
US-20070264596-A1 Thermal acid generator, resist undercoat material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-15 US disclosed
US-20060228648-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2006-10-12 US disclosed
EP-1710230-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2006-10-11 EP disclosed