SCHEMBL1672480

SCHEMBL1672480

O=C(OC(C(F)(F)F)C(F)(F)S(=O)(=O)O)C1CCCCC1.[NaH]

nearest known ligand 0.34

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.34
ALDH1A1 P00352 1/20 0.34
MAPT P10636 1/20 0.34
HTR1E P28566 1/20 0.34
S1PR3 Q99500 1/20 0.34
CES2 O00748 1/20 0.31
CES1 P23141 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
CNR1 P21554 1/20 0.31
ADRB2 P07550 1/20 0.30
ADRB1 P08588 1/20 0.30
ADRB3 P13945 1/20 0.30
CHRM2 P08172 1/20 0.30
CHRM4 P08173 1/20 0.30
CHRM1 P11229 1/20 0.30
CHRM3 P20309 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18785786 0.98 LMNA (0.34) LMNAALDH1A1MAPTHTR1ES1PR3
SCHEMBL18785602 0.98 LMNA (0.34) LMNAALDH1A1MAPTHTR1ES1PR3
SCHEMBL18785776 0.98 LMNA (0.34) LMNAALDH1A1MAPTHTR1ES1PR3
SCHEMBL18785600 0.98 LMNA (0.34) LMNAALDH1A1MAPTHTR1ES1PR3
SCHEMBL18785599 0.98 LMNA (0.34) LMNAALDH1A1MAPTHTR1ES1PR3
SCHEMBL18785783 0.98 LMNA (0.34) LMNAALDH1A1MAPTHTR1ES1PR3
SCHEMBL384333 0.98 LMNA (0.34) LMNAALDH1A1MAPTHTR1ES1PR3
SCHEMBL12216079 0.97 ALDH1A1 (0.33) LMNAALDH1A1MAPTHTR1ES1PR3
SCHEMBL18785295 0.94 HTT (0.33) LMNAALDH1A1MAPTHTR1ES1PR3
SCHEMBL18785290 0.90 CA1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1710230-B1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-14 EP disclosed
US-7919226-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-05 US disclosed
US-7514202-B2 Thermal acid generator, resist undercoat material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-04-07 US disclosed
US-7511169-B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-31 US disclosed
US-20080318160-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process RITTAL GMBH & CO. KG (DE) 2008-12-25 US disclosed
US-20070264596-A1 Thermal acid generator, resist undercoat material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-15 US disclosed
US-20060228648-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2006-10-12 US disclosed
EP-1710230-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2006-10-11 EP disclosed