Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOS1 | P29475 | 2/20 | 0.44 |
| ▸ | AXL | P30530 | 1/20 | 0.44 |
| ▸ | GRM2 | Q14416 | 11/20 | 0.38 |
| ▸ | AHR | P35869 | 1/20 | 0.38 |
| ▸ | ITK | Q08881 | 1/20 | 0.36 |
| ▸ | BACE1 | P56817 | 1/20 | 0.35 |
| ▸ | PBRM1 | Q86U86 | 1/20 | 0.33 |
| ▸ | FEN1 | P39748 | 1/20 | 0.33 |
| ▸ | PSMB8 | P28062 | 1/20 | 0.33 |
| ▸ | PDPK1 | O15530 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9172883 | 0.98 | NOS1 (0.42) | NOS1AXLGRM2AHRITK | |
| Octadecylamine SCHEMBL28535019 | 0.80 | GRM2 (0.42) | GRM2 | |
| SCHEMBL30556736 | 0.77 | METAP2 (0.38) | NOS1AXLPDPK1 | |
| SCHEMBL31619990 | 0.77 | METAP2 (0.38) | NOS1AXLPDPK1 | |
| SCHEMBL30884815 | 0.76 | GAA (0.42) | AXLPSMB8PDPK1 | |
| SCHEMBL922887 | 0.76 | GAA (0.42) | AXLPSMB8PDPK1 | |
| SCHEMBL134766 | 0.74 | — | — | |
| Hydrochloric Acid SCHEMBL6118561 | 0.74 | TDP1 (0.44) | AXLPSMB8PDPK1 | |
| SCHEMBL16517010 | 0.74 | NOS1 (0.44) | NOS1PDPK1 | |
| SCHEMBL11046508 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 436 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3774680-B1 | CLEANING COMPOSITIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-09-24 | — | — | EP | claimed |
| CN-120059587-A | Radiation refrigeration coating for natural gas cylinder and preparation method thereof | 浙江普阳深冷装备股份有限公司 | 2025-05-30 | — | — | CN | claimed |
| US-12187984-B2 | Treatment liquid and method for treating object to be treated | FUJIFILM CORPORATION (JP) | 2025-01-07 | — | — | US | claimed |
| CN-119220352-A | Preparation method of cleaning liquid | 上海新阳半导体材料股份有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-119220351-A | Application of cleaning liquid | 上海新阳半导体材料股份有限公司 | 2024-12-31 | — | — | CN | claimed |
| US-12139693-B2 | Treatment liquid and method for treating object to be treated | FUJIFILM CORPORATION (JP) | 2024-11-12 | — | — | US | claimed |
| CN-118638303-A | Ternary conjugated polymer containing benzotriazole units, and preparation method and application thereof | 西安近代化学研究所 | 2024-09-13 | — | — | CN | claimed |
| EP-3672944-B1 | CLEANING COMPOSITIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2024-08-07 | — | — | EP | claimed |
| US-20240174924-A1 | ETCHING COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-05-30 | — | — | US | claimed |
| CN-114364779-B | Treatment liquid and method for treating object to be treated | 富士胶片株式会社 | 2024-05-28 | — | — | CN | claimed |
| CN-105873691-A | Cleaning formulation for removing residues on surfaces | 富士胶片电子材料美国有限公司 | 2016-08-17 | — | — | CN | claimed |
| CN-105849245-A | Cleaning formulations for removing residues on surfaces | 富士胶片电子材料美国有限公司 | 2016-08-10 | — | — | CN | claimed |
| US-20150267112-A1 | Etching Composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2015-09-24 | — | — | US | claimed |
| WO-2015142778-A1 | ETCHING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-09-24 | — | — | WO | claimed |
| WO-2015089023-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-06-18 | — | — | WO | claimed |
| US-20150159124-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2015-06-11 | — | — | US | claimed |
| WO-2015084921-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-06-11 | — | — | WO | claimed |
| US-20150159125-A1 | CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2015-06-11 | — | — | US | claimed |
| WO-2015060954-A1 | CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-04-30 | — | — | WO | claimed |
| US-20150111804-A1 | CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2015-04-23 | — | — | US | claimed |