SCHEMBL1673787

SCHEMBL1673787

C=C(C)COCC(C)C(=O)O

nearest known ligand 0.39

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.36
GABRR1 P24046 2/20 0.35
CYP1A2 P05177 1/20 0.35
GPR174 Q9BXC1 1/20 0.33
FOLH1 Q04609 2/20 0.31
NAALAD2 Q9Y3Q0 2/20 0.31
ENPEP Q07075 2/20 0.31
BLM P54132 1/20 0.31
APAF1 O14727 1/20 0.31
SLC7A5 Q01650 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15910175 0.79 GABRR1 (0.46) GABRR1CYP1A2FOLH1NAALAD2ENPEP
SCHEMBL10187371 0.78 NOS2 (0.50) TSHRCYP1A2BLMSLC7A5
SCHEMBL8965778 0.75 TSHR (0.33) TSHR
SCHEMBL6848509 0.75
SCHEMBL8965992 0.75 TSHR (0.33) TSHR
SCHEMBL2399127 0.75 FOLH1 (0.39) GPR174FOLH1
SCHEMBL1576720 0.73
SCHEMBL8651937 0.73
SCHEMBL15866578 0.73
SCHEMBL156205 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070010690-A1 Process for manufacturing high purity methacrylic acid DECOURCY MICHAEL S 2007-01-11 US claimed
EP-1493728-A1 Process for manufacturing high purity methacrylic acid ROHM AND HAAS COMPANY (US) 2005-01-05 EP claimed
US-20040267050-A1 Process for manufacturing high purity methacrylic acid DECOURCY MICHAEL STANLEY (US) 2004-12-30 US claimed
EP-2311791-B1 Process for producing (meth)acrylic acids MITSUBISHI CHEM CORP (JP) 2019-01-23 EP disclosed
EP-2311789-B1 Process for producing (meth)acrylic acids MITSUBISHI CHEM CORP (JP) 2015-10-07 EP disclosed
EP-2311790-B1 Process for producing (meth)acrylic acids MITSUBISHI CHEM CORP (JP) 2015-07-29 EP disclosed
EP-1493729-B1 Process for manufacturing high purity methacrylic acid ROHM & HAAS (US) 2014-12-24 EP disclosed
EP-1721884-B1 PROCESS FOR PRODUCING (METH)ACRYLIC ACID MITSUBISHI CHEM CORP (JP) 2014-08-13 EP disclosed
EP-2377843-B1 Method for purifying methacrylic acid-containing streams ROHM & HAAS (US) 2014-01-15 EP disclosed
EP-2377843-A1 Method for purifying methacrylic acid-containing streams Rohm and Haas Company (US) 2011-10-19 EP disclosed
EP-2371803-A1 Method for purifying a HIBA-containing methacrylic acid stream Rohm and Haas Company (US) 2011-10-05 EP disclosed
US-20050004396-A1 Processes for producing (meth)acrylic acid MITSUBISHI CHEMICAL CORPORATION (JP) 2005-01-06 US disclosed
EP-1493729-A1 Process for manufacturing high purity methacrylic acid Rohm and Haas Company (US) 2005-01-05 EP disclosed
EP-1493728-A1 Process for manufacturing high purity methacrylic acid ROHM AND HAAS COMPANY (US) 2005-01-05 EP disclosed
US-20040267050-A1 Process for manufacturing high purity methacrylic acid DECOURCY MICHAEL STANLEY (US) 2004-12-30 US disclosed
US-20040267045-A1 Processes for producing (meth)acrylic acid compound MITSUBISHI CHEMICAL CORPORATION (JP) 2004-12-30 US disclosed
US-20040225149-A1 Method of decomposing by-product during the production of (meth)acrylic ester MITSUBISHI CHEMICAL CORPORATION (JP) 2004-11-11 US disclosed
US-20040220426-A1 Process for producing (meth) acrylic acids MITSUBISHI CHEMICAL CORPORATION (JP) 2004-11-04 US disclosed
US-20040220427-A1 Process for producing (meth)acrylic acid MITSUBISHI CHEMICAL CORPORATION (JP) 2004-11-04 US disclosed
EP-1452518-A1 PROCESS FOR PRODUCING (METH)ACRYLIC ACID COMPOUND MITSUBISHI CHEMICAL CORPORATION (JP) 2004-09-01 EP disclosed