Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | FGF2 | P09038 | 1/20 | 0.32 |
| ▸ | RIPK1 | Q13546 | 2/20 | 0.31 |
| ▸ | FKBP1A | P62942 | 3/20 | 0.30 |
| ▸ | HMGCR | P04035 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14094402 | 0.94 | ALDH1A1 (0.43) | ALDH1A1POLBMEN1KMT2AGAA | |
| SCHEMBL18717783 | 0.85 | SMN1; SMN2 (0.41) | ALDH1A1POLBMEN1KMT2AGAA | |
| SCHEMBL15975539 | 0.82 | GAA (0.35) | ALDH1A1POLBGAANPSR1SMN1; SMN2 | |
| SCHEMBL14094290 | 0.82 | KMT2A (0.43) | ALDH1A1POLBMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL14865371 | 0.79 | POLB (0.53) | ALDH1A1POLBMEN1KMT2AGAA | |
| SCHEMBL14094401 | 0.78 | ALDH1A1 (0.46) | ALDH1A1POLBMEN1KMT2AGAA | |
| SCHEMBL11960702 | 0.78 | ALDH1A1 (0.43) | ALDH1A1POLBGAANPSR1SMN1; SMN2 | |
| SCHEMBL18868414 | 0.78 | KMT2A (0.40) | ALDH1A1POLBMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL12603530 | 0.77 | POLB (0.38) | ALDH1A1POLBGAANPSR1 | |
| SCHEMBL12026661 | 0.74 | KDM4E (0.43) | ALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9726974-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-20150153644-A1 | RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-04 | — | — | US | disclosed |