Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 5/20 | 0.39 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.39 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.38 |
| ▸ | CES1 | P23141 | 8/20 | 0.35 |
| ▸ | FAAH | O00519 | 7/20 | 0.35 |
| ▸ | SMPD1 | P17405 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12323606 | 1.00 | CES2 (0.39) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL14228102 | 0.92 | — | — | |
| SCHEMBL18008764 | 0.83 | CES2 (0.46) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18007996 | 0.83 | CES2 (0.46) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18008120 | 0.83 | CES2 (0.46) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL3974059 | 0.83 | CES2 (0.46) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18008313 | 0.83 | CES2 (0.46) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL16350015 | 0.81 | — | — | |
| Ammonia Solution, Strong SCHEMBL18007811 | 0.81 | CES2 (0.44) | CES2LPAR1LPAR3EPHX1CES1 | |
| Ammonia Solution, Strong SCHEMBL18008893 | 0.81 | CES2 (0.44) | CES2LPAR1LPAR3EPHX1CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9046782-B2 | Resist composition for negative tone development and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |