Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 4/20 | 0.46 |
| ▸ | LPAR1 | Q92633 | 1/20 | 0.46 |
| ▸ | LPAR3 | Q9UBY5 | 1/20 | 0.46 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.44 |
| ▸ | CES1 | P23141 | 9/20 | 0.41 |
| ▸ | FAAH | O00519 | 9/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | GGPS1 | O95749 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18007996 | 1.00 | CES2 (0.46) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18008764 | 1.00 | CES2 (0.46) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18008120 | 1.00 | CES2 (0.46) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL18008313 | 1.00 | CES2 (0.46) | CES2LPAR1LPAR3EPHX1CES1 | |
| Ammonia Solution, Strong SCHEMBL18007800 | 0.98 | CES2 (0.44) | CES2LPAR1LPAR3EPHX1CES1 | |
| Ammonia Solution, Strong SCHEMBL18008893 | 0.98 | CES2 (0.44) | CES2LPAR1LPAR3EPHX1CES1 | |
| Ammonia Solution, Strong SCHEMBL18007811 | 0.98 | CES2 (0.44) | CES2LPAR1LPAR3EPHX1CES1 | |
| Ammonia Solution, Strong SCHEMBL18008221 | 0.98 | CES2 (0.44) | CES2LPAR1LPAR3EPHX1CES1 | |
| SCHEMBL676603 | 0.98 | CES2 (0.42) | CES2LPAR1LPAR3EPHX1CES1 | |
| Dimethylamine SCHEMBL18007849 | 0.94 | EPHX1 (0.44) | CES2LPAR1LPAR3EPHX1CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030170561-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | claimed |
| CN-113252759-A | Electrochemical gas sensor and electrolyte for electrochemical gas sensor | 德尔格安全股份两合公司 | 2021-08-13 | — | — | CN | disclosed |
| US-20200326299-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2020-10-15 | — | — | US | disclosed |
| US-10732144-B2 | Electrochemical gas sensor and electrolyte for an electrochemical gas sensor | Dräger Safety AG & Co. KGaA (DE) | 2020-08-04 | — | — | US | disclosed |
| EP-3367088-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2018-08-29 | — | — | EP | disclosed |
| US-20180031516-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2018-02-01 | — | — | US | disclosed |
| EP-3259583-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2017-12-27 | — | — | EP | disclosed |
| WO-2016131549-A1 | ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR | Dräger Safety AG & Co. KGaA (DE) | 2016-08-25 | — | — | WO | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| EP-1736829-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-12-27 | — | — | EP | disclosed |
| EP-1726608-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2006-11-29 | — | — | EP | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| US-7108955-B2 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| US-20050171226-A1 | Radiation sensitive resin composition | JSR CORPORATION (JP) | 2005-08-04 | — | — | US | disclosed |
| EP-1557718-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-07-27 | — | — | EP | disclosed |
| US-20040143082-A1 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |
| EP-1398339-A1 | POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-03-17 | — | — | EP | disclosed |
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |
| US-20030170561-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-09-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | RARA, SUN2, RARG | CES2 3975/4885LPAR1 3497/4885LPAR3 3466/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.