SCHEMBL1682218

SCHEMBL1682218

C=CC(N)N1CCCC1=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.43
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43
CA2 P00918 1/20 0.43
CA3 P07451 1/20 0.43
CA4 P22748 1/20 0.43
CA6 P23280 1/20 0.43
CA5A P35218 1/20 0.43
CA7 P43166 1/20 0.43
CA9 Q16790 1/20 0.43
CA13 Q8N1Q1 1/20 0.43
CA14 Q9ULX7 1/20 0.43
CA5B Q9Y2D0 1/20 0.43
CHRM2 P08172 2/20 0.36
CHRM4 P08173 2/20 0.36
CHRM5 P08912 2/20 0.36
CHRM1 P11229 2/20 0.36
CHRM3 P20309 2/20 0.36
BRD4 O60885 1/20 0.35
BRD2 P25440 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9285956 0.94 LMNA (0.39) LMNACA12CA1CA2CA3
SCHEMBL22228539 0.83 LMNA (0.42) LMNACA12CA1CA2CA3
SCHEMBL2575684 0.78 LMNA (0.41) LMNACA12CA1CA2CA3
SCHEMBL22228550 0.78 LMNA (0.37) LMNACA12CA1CA2CA3
SCHEMBL169032 0.76 LMNA (0.43) LMNACA12CA1CA2CA3
SCHEMBL2451756 0.76 LMNA (0.43) LMNACA12CA1CA2CA3
SCHEMBL21200450 0.76 LMNA (0.40) LMNACA12CA1CA2CA3
SCHEMBL9492191 0.75
Hydrochloric Acid SCHEMBL10417280 0.75 LMNA (0.50) LMNACA12CA1CA2CA3
SCHEMBL11353524 0.74 LMNA (0.39) LMNACA12CA1CA2CA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0124274-B1 ELECTRON BEAM SENSITIVE MIXTURE RESIST GAF CORPORATION (US) 1988-06-22 EP claimed
EP-0088977-B1 ELECTRON BEAM SENSITIVE RESIST GAF CORPORATION (US) 1988-06-01 EP claimed
EP-0126652-B1 ELECTRON BEAM SENSITIVE MIXTURE RESIST GAF CORPORATION (US) 1987-04-22 EP claimed
US-4542090-A ESTERIFIED AND METALLIZED MALEIC ANHYDRIDE-VINYL ETHER COPOLYMER GAF CORPORATION (US) 1985-09-17 US claimed
EP-0126652-A1 Electron beam sensitive mixture resist GAF CORPORATION (US) 1984-11-28 EP claimed
EP-0124274-A2 Electron beam sensitive mixture resist GAF CORPORATION (US) 1984-11-07 EP claimed
US-4448876-A Electron beam sensitive resist GAF CORPORATION (US) 1984-05-15 US claimed
EP-0088977-A2 Electron beam sensitive resist GAF CORPORATION (US) 1983-09-21 EP claimed
US-4375398-A CROSSLINKING, VINYL ETHER GAF CORPORATION (US) 1983-03-01 US claimed
EP-4013745-B1 BENAZOLIN-CHOLINE AND ITS USE IN THE AGROCHEMICAL FIELD BAYER AG (DE) 2023-09-06 EP disclosed
WO-2023131463-A1 COLOR-PROTECTING DETERGENTS HENKEL AG & CO. KGAA (DE) 2023-07-13 WO disclosed
WO-2023131461-A1 COLOR-PROTECTING DETERGENTS HENKEL AG & CO. KGAA (DE) 2023-07-13 WO disclosed
WO-2023131528-A1 COLOR-PROTECTING DETERGENTS HENKEL AG & CO. KGAA (DE) 2023-07-13 WO disclosed
WO-2023131462-A1 COLOR-PROTECTING DETERGENTS HENKEL AG & CO. KGAA (DE) 2023-07-13 WO disclosed
EP-0126652-A1 Electron beam sensitive mixture resist GAF CORPORATION (US) 1984-11-28 EP disclosed
EP-0124274-A2 Electron beam sensitive mixture resist GAF CORPORATION (US) 1984-11-07 EP disclosed
US-4448876-A Electron beam sensitive resist GAF CORPORATION (US) 1984-05-15 US disclosed
US-4448875-A HALF-ESTER OR -AMIDE OF ALKYL VINYL ETHER-MALEIC ANHYDRIDE COPOLYMER GAF CORPORATION (US) 1984-05-15 US disclosed
EP-0088977-A2 Electron beam sensitive resist GAF CORPORATION (US) 1983-09-21 EP disclosed
US-4375398-A CROSSLINKING, VINYL ETHER GAF CORPORATION (US) 1983-03-01 US disclosed