SCHEMBL1683191

SCHEMBL1683191

Cc1c(N)ccc([N+](=O)[O-])c1C

nearest known ligand 0.57

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.57
TDP1 Q9NUW8 6/20 0.56
CYP3A4 P08684 5/20 0.50
ALDH1A1 P00352 5/20 0.50
MEN1 O00255 2/20 0.50
POLB P06746 2/20 0.50
MAPT P10636 2/20 0.50
KMT2A Q03164 2/20 0.50
ALOX15 P16050 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
RECQL P46063 1/20 0.47
HSD17B10 Q99714 1/20 0.43
LMNA P02545 2/20 0.43
PKM P14618 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10484652 0.92 TSHR (0.50) TSHRTDP1CYP3A4ALDH1A1MEN1
SCHEMBL9719281 0.86 TDP1 (0.71) TSHRTDP1CYP3A4ALDH1A1MAPT
SCHEMBL30503599 0.86 TDP1 (0.71) TSHRTDP1CYP3A4ALDH1A1MAPT
SCHEMBL588286 0.85 TSHR (0.55) TSHRTDP1CYP3A4ALDH1A1MEN1
SCHEMBL2056814 0.85 TSHR (0.60) TSHRTDP1CYP3A4ALDH1A1MEN1
SCHEMBL1635417 0.83 TSHR (0.53) TSHRTDP1CYP3A4ALDH1A1MEN1
SCHEMBL30857795 0.83 TSHR (0.53) TSHRTDP1CYP3A4ALDH1A1MEN1
SCHEMBL28065463 0.83 TSHR (0.53) TSHRTDP1CYP3A4ALDH1A1MEN1
SCHEMBL2006430 0.83 TSHR (0.53) TSHRTDP1CYP3A4ALDH1A1MEN1
SCHEMBL28038852 0.83 TSHR (0.53) TSHRTDP1CYP3A4ALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116621704-A Preparation method of 2, 3-dimethyl-4-nitrobenzoic acid 清源创新实验室 2023-08-22 CN claimed
CN-114515520-B Acid-resistant nanofiltration membrane with high flux and high selectivity based on Taylor base and preparation method thereof 浙江工业大学 2023-06-02 CN claimed
CN-114515520-A Acid-resistant nanofiltration membrane based on Teller's base with high flux and high selectivity and preparation method thereof 浙江工业大学 2022-05-20 CN claimed
EP-1437749-B1 ELECTROLYTE SOLUTION FOR DRIVING ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR RUBYCON CORP (JP) 2013-07-17 EP claimed
US-7539006-B2 Electrolytic solution for driving electrolytic capacitor and electrolytic capacitor RUBYCON CORPORATION (JP) 2009-05-26 US claimed
US-20070029529-A1 Electrolytic solution for driving electrolytic capacitor and electrolytic capacitor KOMATSU AKIHIKO 2007-02-08 US claimed
US-20040245105-A1 Electrolyte solution for driving electrolytic capacitor and electrolytic capacitor RUBYCON CORPORATION (JP) 2004-12-09 US claimed
EP-1437749-A1 ELECTROLYTE SOLUTION FOR DRIVING ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR Rubycon Corporation (JP) 2004-07-14 EP claimed
CN-116621704-A Preparation method of 2, 3-dimethyl-4-nitrobenzoic acid 清源创新实验室 2023-08-22 CN disclosed
CN-114515520-B Acid-resistant nanofiltration membrane with high flux and high selectivity based on Taylor base and preparation method thereof 浙江工业大学 2023-06-02 CN disclosed
CN-114515520-A Acid-resistant nanofiltration membrane based on Teller's base with high flux and high selectivity and preparation method thereof 浙江工业大学 2022-05-20 CN disclosed
CN-103543607-B Organic EL element, radiation sensitive linear resin composition and cured film JSR株式会社 2019-11-29 CN disclosed
CN-109790564-A With the method for solvatochromic dye conjugation analyte detection mycobacteria 斯坦福大学托管董事会 2019-05-21 CN disclosed
CN-103116232-B The manufacture method of array base palte, liquid crystal display cells and array base palte JSR株式会社 2016-12-21 CN disclosed
EP-0416118-A1 PRODUCTION OF p-PHENYLENEDIAMINES NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1991-03-13 EP disclosed
EP-0280156-A2 Process for the preparation of acetoacetylarylamides-heteroarylamides respectively of deactived aromatic compounds HOECHST AKTIENGESELLSCHAFT (DE) 1988-08-31 EP disclosed
US-4118232-A Photographic material containing sulphonic acid group containing disazo dyestuffs CIBA-GEIGY AG (CH) 1978-10-03 US disclosed
US-4051123-A Sulfonic-acid-group containing disazo dyestuffs CIBA-GEIGY AG (CH) 1977-09-27 US disclosed
US-3968188-A Process for preparing the pentaerythritol ester of phosphorohalidous acid MONSANTO COMPANY (US) 1976-07-06 US disclosed
US-3957860-A SULFAMIC ACID CIBA-GEIGY AG (CH) 1976-05-18 US disclosed