SCHEMBL16840299

SCHEMBL16840299

CC(C)(COCC(C)(CO)COCCF)COCC(C)(CO)COCCF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10141555 0.87
SCHEMBL10014829 0.79
SCHEMBL887505 0.79 CES1 (0.33)
SCHEMBL12039858 0.78 NUDT1 (0.31)
SCHEMBL12918948 0.78
SCHEMBL12918953 0.78
SCHEMBL10018605 0.76
SCHEMBL19592037 0.75 TSHR (0.47)
SCHEMBL284658 0.75
SCHEMBL283952 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9581901-B2 Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-02-28 US disclosed
US-9229319-B2 Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-01-05 US disclosed
US-20150177615-A1 PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-06-25 US disclosed
US-20150177613-A1 PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-06-25 US disclosed