SCHEMBL1686572

SCHEMBL1686572

Oc1c(Cl)c(Cl)c(C(Cl)(Cl)Cl)c(Cl)c1Cl

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.53
HPGD P15428 5/20 0.53
HSD17B10 Q99714 5/20 0.53
MEN1 O00255 2/20 0.53
ALDH1A1 P00352 2/20 0.53
LMNA P02545 2/20 0.53
MAPT P10636 2/20 0.53
KMT2A Q03164 2/20 0.53
CYP1A2 P05177 4/20 0.37
CYP2C9 P11712 4/20 0.37
HIF1A Q16665 3/20 0.37
CYP3A4 P08684 2/20 0.37
CASP1 P29466 1/20 0.36
MAPK1 P28482 3/20 0.33
USP2 O75604 1/20 0.32
TP53 P04637 1/20 0.32
GLA P06280 1/20 0.32
THRB P10828 1/20 0.32
ALOX15 P16050 1/20 0.32
ALOX12 P18054 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11789672 0.85 TSHR (0.50) TSHRHPGDHSD17B10MEN1ALDH1A1
SCHEMBL3388256 0.83 TSHR (0.32) TSHR
SCHEMBL1538519 0.79 TSHR (0.30) TSHR
SCHEMBL11757248 0.76
SCHEMBL31424062 0.75 TSHR (0.32) TSHR
Tetrachlorohydroquinone SCHEMBL48198 0.75 HSD17B10 (0.90) TSHRHPGDHSD17B10MEN1ALDH1A1
SCHEMBL26618446 0.73 TSHR (0.50) TSHRHPGDHSD17B10MEN1ALDH1A1
SCHEMBL112121 0.73 TSHR (0.50) TSHRHPGDHSD17B10MEN1ALDH1A1
SCHEMBL11757104 0.72
Pentachlorophenol SCHEMBL28030118 0.72 HSD17B10 (0.83) TSHRHPGDHSD17B10MEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12577373-B2 Carbodiimide composition, curing agent composition, coating composition and resin cured product ASAHI KASEI KABUSHIKI KAISHA (JP) 2026-03-17 US disclosed
CN-112654927-B Photosensitive resin composition, resin sheet, cured film, organic EL display device, semiconductor electronic component, semiconductor device, and method for producing organic EL display device 东丽株式会社 2024-02-27 CN disclosed
US-11852973-B2 Photosensitive resin composition, resin sheet, cured film, organic EL display device, semiconductor electronic component, semiconductor device, and method for producing organic EL display device TORAY INDUSTRIES, INC. (JP) 2023-12-26 US disclosed
CN-111133382-B Photosensitive resin composition, cured film, element and organic EL display device having cured film, and method for producing same 东丽株式会社 2023-10-31 CN disclosed
US-20230135772-A1 CARBODIIMIDE COMPOSITION, CURING AGENT COMPOSITION, COATING COMPOSITION AND RESIN CURED PRODUCT ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-05-04 US disclosed
EP-4130154-A1 CARBODIIMIDE COMPOSITION, HARDENER COMPOSITION, COATING COMPOSITION, AND CURED RESIN OBJECT Asahi Kasei Kabushiki Kaisha (JP) 2023-02-08 EP disclosed
CN-115190901-A Carbodiimide composition, curing agent composition, coating composition, and resin cured product 旭化成株式会社 2022-10-14 CN disclosed
US-20210332166-A1 PHOTOSENSITIVE RESIN COMPOSITION, RESIN SHEET, CURED FILM, ORGANIC EL DISPLAY DEVICE, SEMICONDUCTOR ELECTRONIC COMPONENT, SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING ORGANIC EL DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2021-10-28 US disclosed
US-20210149304-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT COMPRISING CURED FILM, ORGANIC EL DISPLAY DEVICE COMPRISING CURED FILM, METHOD FOR PRODUCING CURED FILM, AND METHOD FOR PRODUCING ORGANIC EL DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2021-05-20 US disclosed
CN-112654927-A Photosensitive resin composition, resin sheet, cured film, organic EL display device, semiconductor electronic component, semiconductor device, and method for producing organic EL display device 东丽株式会社 2021-04-13 CN disclosed
CN-1196716-C Modified particle, support, catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL CO (JP) 2005-04-13 CN disclosed
US-6870015-B2 Catalyst component for addition polymerization, process for producing catalyst for addition polymerization and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-03-22 US disclosed
CN-1496996-A Modified granular, addition polymerized catalyst composition, addition polymerization catalyst and method of producing addition polymerization product ס�ѻ�ѧ��ҵ��ʽ���� 2004-05-19 CN disclosed
CN-1422286-A Modified particle, support, catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL CO (JP) 2003-06-04 CN disclosed
US-20030069127-A1 Modified particle,support, catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMTED (JP) 2003-04-10 US disclosed
EP-1300425-A2 Catalyst component for addition polymerization, process for producing said catalyst and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-09 EP disclosed
CN-1408738-A Catalytic component for addition polymerization, process for producing addition polymerization and process for producing addition polymer SUMITOMO CHEMICAL CO (JP) 2003-04-09 CN disclosed
US-20030060579-A1 Catalyst component for addition polymerization, process for producing catalyst for addition polymerization and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-03-27 US disclosed
EP-1275662-A1 MODIFIED PARTICLE, SUPPORT, CATALYST COMPONENT FOR ADDITION POLYMERIZATION, CATALYST FOR ADDITION POLYMERIZATION, AND PROCESS FOR PRODUCING ADDITION POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-01-15 EP disclosed
US-20020143124-A1 Homogeneous type solid catalyst component or homogeneous type solid catalyst, process for production thereof and process for producing addition polymer with the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-10-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12577373-B2 Carbodiimide composition, curing agent composition, coating composition and resin cured product CD38, PARP9, MCCC2 TSHR 4705/4885HPGD 2975/4885HSD17B10 3291/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.