SCHEMBL16865882

SCHEMBL16865882

CCCOC(=O)CCSCCOCCOC

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DGKA P23743 1/20 0.37
ALDH1A1 P00352 4/20 0.36
HPGD P15428 1/20 0.36
HSD17B10 Q99714 1/20 0.34
GLA P06280 1/20 0.33
ABCB11 O95342 1/20 0.33
CYP3A4 P08684 1/20 0.33
ADRA2B P18089 1/20 0.33
OPRD1 P41143 1/20 0.33
SCN5A Q14524 1/20 0.33
PLA2G4B P0C869 1/20 0.33
DNM1 Q05193 1/20 0.32
ADRA2A P08913 1/20 0.32
ADRA1A P35348 1/20 0.32
HTR2C P28335 1/20 0.31
USP2 O75604 1/20 0.31
MAPT P10636 2/20 0.31
BLM P54132 1/20 0.31
MAPK1 P28482 1/20 0.31
EPHX2 P34913 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL109395 0.84 DGKA (0.48) DGKAALDH1A1HPGDHSD17B10GLA
SCHEMBL23517121 0.82 DGKA (0.42) DGKAALDH1A1HPGDHSD17B10PLA2G4B
SCHEMBL10666704 0.81 DGKA (0.45) DGKAALDH1A1HPGDHSD17B10GLA
SCHEMBL17909686 0.80 DGKA (0.50) DGKAALDH1A1ABCB11CYP3A4ADRA2B
SCHEMBL17908938 0.80 DGKA (0.50) DGKAALDH1A1ABCB11CYP3A4ADRA2B
SCHEMBL17909482 0.80 DGKA (0.50) DGKAALDH1A1ABCB11CYP3A4ADRA2B
SCHEMBL24241730 0.79 DGKA (0.48) DGKAALDH1A1GLAABCB11CYP3A4
SCHEMBL16948460 0.78 DGKA (0.50) DGKAALDH1A1PLA2G4BDNM1HTR2C
SCHEMBL10338675 0.78 DGKA (0.53) DGKAALDH1A1HSD17B10CYP3A4PLA2G4B
SCHEMBL13609401 0.78 DGKA (0.47) DGKAALDH1A1HSD17B10GLAABCB11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150185606-A1 CURABLE COMPOSITION FOR PHOTO IMPRINTS, METHOD FOR FORMING PATTERN, FINE PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-07-02 US disclosed