SCHEMBL16874375

SCHEMBL16874375

CC(C)(C)OOCC1CCCCC1

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.38
CTSL P07711 1/20 0.33
CTSB P07858 1/20 0.33
CTSK P43235 1/20 0.33
LMNA P02545 1/20 0.33
SIGMAR1 Q99720 3/20 0.32
SLC1A3 P43003 2/20 0.31
SLC1A2 P43004 2/20 0.31
SLC1A1 P43005 2/20 0.31
TSHR P16473 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22462275 1.00 CYP1A2 (0.38) CYP1A2CTSLCTSBCTSKLMNA
SCHEMBL23002465 0.88 TSHR (0.35) TSHRTDP1
SCHEMBL11682621 0.77 CTSL (0.41) CYP1A2CTSLCTSBCTSKLMNA
SCHEMBL7739306 0.76 ALDH1A1 (0.44) CYP1A2CTSLCTSBCTSKLMNA
SCHEMBL7741214 0.76 ALDH1A1 (0.44) CYP1A2CTSLCTSBCTSKLMNA
SCHEMBL7739610 0.76 ALDH1A1 (0.44) CYP1A2CTSLCTSBCTSKLMNA
SCHEMBL7738572 0.76 ALDH1A1 (0.44) CYP1A2CTSLCTSBCTSKLMNA
SCHEMBL7738673 0.76 ALDH1A1 (0.44) CYP1A2CTSLCTSBCTSKLMNA
SCHEMBL4644446 0.75
SCHEMBL8130446 0.73 CYP1A2 (0.37) CYP1A2CTSLCTSBCTSKLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114787209-A Polyethylene copolymers and products and processes thereof 布拉斯科有限公司 2022-07-22 CN disclosed
CN-114765981-A Polyethylene copolymers and products and processes thereof 布拉斯科有限公司 2022-07-19 CN disclosed
US-9379051-B2 Semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2016-06-28 US disclosed
US-20150194376-A1 SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2015-07-09 US disclosed
CN-100443517-C Method for preparing styrenic resin having high impact strength and gloss LG CHEMICAL LTD (KR) 2008-12-17 CN disclosed
CN-1746201-A Method for preparing styrenic resin having high impact strength and gloss LG CHEMICAL LTD (KR) 2006-03-15 CN disclosed
CN-1186358-C Method for producing polyethylene BASELL POLYOLEFINE GMBH (DE) 2005-01-26 CN disclosed
CN-1429238-A Method for producing polyethylene BASELL POLYOLEFINE GMBH (DE) 2003-07-09 CN disclosed