Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2B | Q13224 | 4/20 | 0.49 |
| ▸ | GRIN2D | O15399 | 3/20 | 0.49 |
| ▸ | GRIN3B | O60391 | 3/20 | 0.49 |
| ▸ | ADRA1D | P25100 | 3/20 | 0.49 |
| ▸ | ADRA1A | P35348 | 3/20 | 0.49 |
| ▸ | ADRA1B | P35368 | 3/20 | 0.49 |
| ▸ | GRIN1 | Q05586 | 3/20 | 0.49 |
| ▸ | GRIN2A | Q12879 | 3/20 | 0.49 |
| ▸ | GRIN2C | Q14957 | 3/20 | 0.49 |
| ▸ | GRIN3A | Q8TCU5 | 3/20 | 0.49 |
| ▸ | ESR1 | P03372 | 7/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 7/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14734507 | 1.00 | GRIN2B (0.49) | GRIN2BGRIN2DGRIN3BADRA1DADRA1A | |
| SCHEMBL20727175 | 0.91 | ESR2 (0.50) | GRIN2BGRIN2DGRIN3BADRA1DADRA1A | |
| SCHEMBL12290753 | 0.91 | ESR1 (0.50) | GRIN2BGRIN2DGRIN3BADRA1DADRA1A | |
| SCHEMBL386761 | 0.89 | P4HB (0.49) | GRIN2BGRIN2DGRIN3BADRA1DADRA1A | |
| SCHEMBL18594867 | 0.89 | P4HB (0.49) | GRIN2BGRIN2DGRIN3BADRA1DADRA1A | |
| SCHEMBL2948678 | 0.85 | GBA1 (0.66) | GRIN2BGRIN2DGRIN3BADRA1DADRA1A | |
| SCHEMBL10546238 | 0.85 | GRIN2B (0.43) | GRIN2BGRIN2DGRIN3BADRA1DADRA1A | |
| Hydrochloric Acid SCHEMBL1006327 | 0.83 | GBA1 (0.63) | GRIN2BGRIN2DGRIN3BADRA1DADRA1A | |
| SCHEMBL4364820 | 0.83 | ESR2 (0.53) | GRIN2BGRIN2DGRIN3BADRA1DADRA1A | |
| SCHEMBL13279296 | 0.80 | GRIN2B (0.50) | GRIN2BGRIN2DGRIN3BADRA1DADRA1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |