SCHEMBL16902860

SCHEMBL16902860

c1ccc2cc(OCOc3ccc4ccccc4c3)ccc2c1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AGXT P21549 2/20 0.68
TDP1 Q9NUW8 2/20 0.65
KDM4E B2RXH2 2/20 0.65
MAPK1 P28482 2/20 0.65
ALOX5 P09917 1/20 0.63
PTPN7 P35236 1/20 0.59
CYP1A2 P05177 1/20 0.56
CYP2A6 P11509 1/20 0.56
RAB9A P51151 6/20 0.55
NPC1 O15118 5/20 0.55
MAPT P10636 2/20 0.55
SMN1; SMN2 Q16637 2/20 0.55
HTT P42858 3/20 0.52
PPARG P37231 2/20 0.52
MEN1 O00255 2/20 0.52
KMT2A Q03164 2/20 0.52
NCOA2 Q15596 1/20 0.52
NCOA1 Q15788 1/20 0.52
NPSR1 Q6W5P4 1/20 0.52
NR2E3 Q9Y5X4 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29936898 0.87 CYP1A2 (0.59) AGXTTDP1KDM4EMAPK1ALOX5
SCHEMBL1961527 0.87 CYP1A2 (0.59) AGXTTDP1KDM4EMAPK1ALOX5
SCHEMBL16902851 0.85 TDP1 (0.87) AGXTTDP1KDM4EMAPK1ALOX5
SCHEMBL16893544 0.83 TDP1 (0.58) AGXTTDP1KDM4EMAPK1ALOX5
SCHEMBL27938239 0.83 MAPK1 (0.58) AGXTTDP1KDM4EMAPK1ALOX5
SCHEMBL1859481 0.83 TDP1 (0.76) AGXTTDP1KDM4EMAPK1ALOX5
SCHEMBL8565990 0.83 TDP1 (0.76) AGXTTDP1KDM4EMAPK1ALOX5
SCHEMBL29429997 0.83 TDP1 (0.76) AGXTTDP1KDM4EMAPK1ALOX5
SCHEMBL16902850 0.81 TDP1 (0.73) AGXTTDP1KDM4EMAPK1ALOX5
SCHEMBL16902859 0.81 TDP1 (0.73) AGXTTDP1KDM4EMAPK1ALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed