Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM5A | P29375 | 1/20 | 0.48 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | TLR4 | O00206 | 1/20 | 0.47 |
| ▸ | TLR2 | O60603 | 1/20 | 0.47 |
| ▸ | NR1H4 | Q96RI1 | 1/20 | 0.46 |
| ▸ | MAOA | P21397 | 3/20 | 0.46 |
| ▸ | MAOB | P27338 | 3/20 | 0.46 |
| ▸ | ACHE | P22303 | 1/20 | 0.46 |
| ▸ | GPBAR1 | Q8TDU6 | 1/20 | 0.44 |
| ▸ | CYSLTR1 | Q9Y271 | 1/20 | 0.44 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.44 |
| ▸ | PPARD | Q03181 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6241502 | 1.00 | KDM5A (0.48) | KDM5AKDM4CTSHRSMN1; SMN2TLR4 | |
| SCHEMBL31220919 | 0.92 | TLR4 (0.50) | TLR4TLR2MAOAMAOB | |
| SCHEMBL4569158 | 0.92 | TLR4 (0.50) | TLR4TLR2MAOAMAOB | |
| SCHEMBL4682048 | 0.83 | ACACB (0.48) | TSHRSMN1; SMN2GPBAR1CYSLTR1PPARD | |
| SCHEMBL20421214 | 0.83 | MAOA (0.48) | KDM5AKDM4CTSHRSMN1; SMN2NR1H4 | |
| SCHEMBL11942141 | 0.83 | ALDH1A1 (0.51) | KDM5AKDM4CTSHRSMN1; SMN2TLR4 | |
| SCHEMBL1408716 | 0.83 | TLR4 (0.47) | KDM5AKDM4CTSHRSMN1; SMN2TLR4 | |
| SCHEMBL6851212 | 0.83 | TLR4 (0.47) | KDM5AKDM4CTSHRSMN1; SMN2TLR4 | |
| SCHEMBL28286417 | 0.83 | TLR4 (0.50) | KDM5AKDM4CTSHRSMN1; SMN2TLR4 | |
| Hydrochloric Acid SCHEMBL15819873 | 0.81 | TLR4 (0.46) | KDM5AKDM4CTLR4TLR2MAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |