SCHEMBL16902903

SCHEMBL16902903

Oc1ccc(C2(c3ccc(OCCCOc4ccc(C5(c6ccc(O)cc6)c6ccccc6-c6ccccc65)cc4)cc3)c3ccccc3-c3ccccc32)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ DRD4 P21917 2/20 0.46
▸ DRD2 P14416 1/20 0.46
▸ DRD3 P35462 1/20 0.46
▸ LMNA P02545 3/20 0.46
▸ MEN1 O00255 2/20 0.46
▸ MAPT P10636 2/20 0.46
▸ KMT2A Q03164 2/20 0.46
▸ SMN1; SMN2 Q16637 2/20 0.46
▸ KDM4E B2RXH2 1/20 0.46
▸ OPRK1 P41145 1/20 0.46
▸ LTA4H P09960 3/20 0.44
▸ NR5A1 Q13285 1/20 0.44
▸ ESR1 P03372 4/20 0.43
▸ ESR2 Q92731 3/20 0.43
▸ CYP1A2 P05177 1/20 0.42
▸ PTGS1 P23219 1/20 0.42
▸ SLC6A2 P23975 1/20 0.42
▸ CYP2C19 P33261 1/20 0.42
▸ PTGS2 P35354 1/20 0.42
▸ SLC6A3 Q01959 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16902904 0.97 NR5A1 (0.47) DRD4DRD2DRD3LMNAMEN1
SCHEMBL16902917 0.95 NR5A1 (0.50) DRD4DRD2DRD3LMNAMEN1
SCHEMBL16902914 0.95 NR5A1 (0.50) DRD4DRD2DRD3LMNAMEN1
SCHEMBL16902906 0.95 NR5A1 (0.50) DRD4DRD2DRD3LMNAMEN1
SCHEMBL16902910 0.95 NR5A1 (0.50) DRD4DRD2DRD3LMNAMEN1
SCHEMBL16902919 0.95 NR5A1 (0.50) DRD4DRD2DRD3LMNAMEN1
SCHEMBL16902909 0.95 NR5A1 (0.50) DRD4DRD2DRD3LMNAMEN1
SCHEMBL16902908 0.95 NR5A1 (0.50) DRD4DRD2DRD3LMNAMEN1
SCHEMBL16902912 0.95 NR5A1 (0.50) DRD4DRD2DRD3LMNAMEN1
SCHEMBL16902905 0.95 LMNA (0.47) DRD4DRD2DRD3LMNAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 — — US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 — — US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 — — US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 — — US disclosed
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