Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR5A1 | Q13285 | 1/20 | 0.50 |
| ▸ | DRD4 | P21917 | 2/20 | 0.45 |
| ▸ | DRD2 | P14416 | 1/20 | 0.45 |
| ▸ | DRD3 | P35462 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.45 |
| ▸ | PDK2 | Q15119 | 7/20 | 0.44 |
| ▸ | LTA4H | P09960 | 2/20 | 0.44 |
| ▸ | ESR1 | P03372 | 2/20 | 0.42 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.41 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16902912 | 1.00 | NR5A1 (0.50) | NR5A1DRD4DRD2DRD3LMNA | |
| SCHEMBL16902908 | 1.00 | NR5A1 (0.50) | NR5A1DRD4DRD2DRD3LMNA | |
| SCHEMBL16902914 | 1.00 | NR5A1 (0.50) | NR5A1DRD4DRD2DRD3LMNA | |
| SCHEMBL16902909 | 1.00 | NR5A1 (0.50) | NR5A1DRD4DRD2DRD3LMNA | |
| SCHEMBL16902919 | 1.00 | NR5A1 (0.50) | NR5A1DRD4DRD2DRD3LMNA | |
| SCHEMBL16902910 | 1.00 | NR5A1 (0.50) | NR5A1DRD4DRD2DRD3LMNA | |
| SCHEMBL16902917 | 1.00 | NR5A1 (0.50) | NR5A1DRD4DRD2DRD3LMNA | |
| SCHEMBL16902904 | 0.98 | NR5A1 (0.47) | NR5A1DRD4DRD2DRD3LMNA | |
| SCHEMBL16902903 | 0.95 | DRD4 (0.46) | NR5A1DRD4DRD2DRD3LMNA | |
| SCHEMBL16902905 | 0.94 | LMNA (0.47) | NR5A1DRD4DRD2DRD3LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9977330-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-22 | — | — | US | disclosed |
| US-9977330-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-22 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9310681-B2 | Negative resist composition and patterning process using same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-12 | — | — | US | disclosed |
| US-9261788-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9261788-B2 | Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-02-16 | — | — | US | disclosed |
| US-20160018735-A1 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2016-01-21 | — | — | US | disclosed |
| US-20160018735-A1 | COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2016-01-21 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150198883-A1 | NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |