Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 3/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.40 |
| ▸ | THRA | P10827 | 1/20 | 0.40 |
| ▸ | TYMS | P04818 | 1/20 | 0.38 |
| ▸ | PPARD | Q03181 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | PDE6D | O43924 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | PPARG | P37231 | 1/20 | 0.35 |
| ▸ | PPARA | Q07869 | 1/20 | 0.35 |
| ▸ | TGM2 | P21980 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14173235 | 0.94 | THRB (0.43) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL14173224 | 0.93 | THRB (0.45) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL14173230 | 0.91 | THRB (0.46) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL14173223 | 0.90 | THRB (0.46) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL15908400 | 0.87 | THRB (0.46) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL28986428 | 0.86 | THRB (0.47) | THRBKMT2AKDM4ETDP1MAPT | |
| SCHEMBL39820 | 0.86 | L3MBTL1 (0.47) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL30593911 | 0.86 | L3MBTL1 (0.47) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL13048616 | 0.85 | L3MBTL1 (0.50) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL16921467 | 0.85 | THRB (0.44) | THRBKMT2AKDM4EALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8536270-B2 | Resist composition, resist layer, imprinting method, pattern formation, method for producing magnetic recording medium, and magnetic recording medium | FUJIFILM (JP) | 2013-09-17 | — | — | US | claimed |
| US-9005512-B2 | Method for forming patterns and method for producing patterned substrates | FUJIFILM CORPORATION (JP) | 2015-04-14 | — | — | US | disclosed |
| US-8536270-B2 | Resist composition, resist layer, imprinting method, pattern formation, method for producing magnetic recording medium, and magnetic recording medium | FUJIFILM (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20130032971-A1 | METHOD FOR FORMING PATTERNS AND METHOD FOR PRODUCING PATTERNED SUBSTRATES | FUJIFILM CORPORATION (JP) | 2013-02-07 | — | — | US | disclosed |
| WO-2012002556-A1 | LIQUID APPLICATION DEVICE, LIQUID APPLICATION METHOD, AND NANOIMPRINT SYSTEM | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | WO | disclosed |
| WO-2011126131-A1 | PATTERN FORMING METHOD AND PROCESS FOR PRODUCING PATTERN SUBSTRATES | FUJIFILM CORPORATION (JP) | 2011-10-13 | — | — | WO | disclosed |
| US-20100247970-A1 | RESIST COMPOSITION, RESIST LAYER, IMPRINTING METHOD, PATTERN FORMATION, METHOD FOR PRODUCING MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |