SCHEMBL1697441

SCHEMBL1697441

NC(=O)OOOC(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2221620 0.82
SCHEMBL9577599 0.82
SCHEMBL4270528 0.78 LMNA (0.42)
SCHEMBL31672299 0.75 ALOX15 (0.37)
SCHEMBL9697894 0.72 LMNA (0.36)
SCHEMBL8919442 0.72
SCHEMBL10587322 0.69
SCHEMBL20804114 0.69
SCHEMBL4462025 0.69
SCHEMBL4010701 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116855154-A Time-controllable ultraviolet curing system and preparation method and application thereof 南京工程学院 2023-10-10 CN claimed
CN-115558419-B Photo-curing composite epoxy fluorosilicone resin coating and preparation method and coating preparation method thereof 西安长峰机电研究所 2023-07-21 CN claimed
CN-115124912-B High-performance inner wall protective wall film and preparation method thereof 浙江博星化工涂料有限公司 2023-07-07 CN claimed
CN-115124912-A High-performance interior wall protective wall film and preparation method thereof 浙江博星化工涂料有限公司 2022-09-30 CN claimed
WO-2012004811-A1 PROCESS FOR THE PREPARATION OF 5-SUBSTSITUTED INDOLE DERIVATIVE IND-SWIFT LABORATORIES LIMITED (IN) 2012-01-12 WO claimed
WO-1998047926-A2 ETHYLENEIMINE-CONTAINING RESINS, MANUFACTURE, AND USE FOR CHEMICAL SEPARATIONS AAG INDUSTRIES, INC. (US) 1998-10-29 WO claimed
WO-1998007756-A2 ETHYLENEIMINE-CONTAINING RESINS, MANUFACTURE, AND USE FOR CHEMICAL SEPARATIONS AAG INDUSTRIES, INC. (US) 1998-02-26 WO claimed
CN-116855154-A Time-controllable ultraviolet curing system and preparation method and application thereof 南京工程学院 2023-10-10 CN disclosed
CN-116855154-A Time-controllable ultraviolet curing system and preparation method and application thereof 南京工程学院 2023-10-10 CN disclosed
CN-115558419-B Photo-curing composite epoxy fluorosilicone resin coating and preparation method and coating preparation method thereof 西安长峰机电研究所 2023-07-21 CN disclosed
CN-115124912-B High-performance inner wall protective wall film and preparation method thereof 浙江博星化工涂料有限公司 2023-07-07 CN disclosed
CN-115558419-A Photocuring composite epoxy fluorosilicone resin coating and preparation method thereof and coating preparation method 西安长峰机电研究所 2023-01-03 CN disclosed
CN-112062937-B Carbamate-based epoxy compounds, methods of making, and uses thereof 南京聚发新材料有限公司 2022-11-25 CN disclosed
EP-0680988-A2 Carbamate compounds and coating compositions comprising same CYTEC TECHNOLOGY CORP. (US) 1995-11-08 EP disclosed
US-4742169-A Process for the preparation of halohydroxyalkyl carbamates and 2,3-epoxy carbamates THE DOW CHEMICAL COMPANY (US) 1988-05-03 US disclosed
US-4719301-A Process for preparing novel 3-halo-2-hydroxyalkyl carbamates THE DOW CHEMICAL COMPANY (US) 1988-01-12 US disclosed
US-4629791-A Novel 3-halo-2-hydroxyalkyl carbamates THE DOW CHEMICAL COMPANY (US) 1986-12-16 US disclosed
EP-0152820-A2 Carbamate compounds, compositions and method of making the same CYTEC TECHNOLOGY CORP. (US) 1985-08-28 EP disclosed
US-4501874-A 2,3-Epoxy carbamates THE DOW CHEMICAL COMPANY (US) 1985-02-26 US disclosed
US-4484994-A REACTING EPOXY RESIN WITH AMINES HAVING SECONDARY AMINE AND CARBAMATE GROUPS AMERICAN CYANAMID COMPANY (US) 1984-11-27 US disclosed