SCHEMBL169944

SCHEMBL169944

CCC(C)(C)C(C)(CC(C)(C)C)C(=O)O

nearest known ligand 0.35

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.33
ALDH1A1 P00352 2/20 0.33
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
HIF1A Q16665 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30
THRB P10828 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL178650 0.86 TSHR (0.33) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL9886728 0.84 TSHR (0.32) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL9710097 0.82 TSHR (0.38) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL15787218 0.82 TSHR (0.31) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL8356639 0.81 ALDH1A1 (0.34) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL15787132 0.80
SCHEMBL12835383 0.80 ALDH1A1 (0.31) ALDH1A1TDP1MEN1CYP1A2THRB
SCHEMBL12958014 0.79 TSHR (0.30) TSHRTDP1
SCHEMBL13061749 0.79 TSHR (0.30) TSHRTDP1
SCHEMBL890334 0.77 TSHR (0.38) TSHRALDH1A1CYP2D6CYP2C19HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2651991-B2 USE OF A POLYMER OF ACRYLIC ACID AS DISPERSANT IN MINERAL PROCESSING BASF SE (DE) 2022-12-21 EP disclosed
US-20170190167-A1 PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING SAME, AND PRINTING METHOD USING SAME FUJIFILM CORPORATION (JP) 2017-07-06 US disclosed
EP-3184511-A1 IMIDAZOLE COMPOUND, METAL SURFACE TREATMENT LIQUID, METAL SURFACE TREATMENT METHOD, AND LAMINATE PRODUCTION METHOD Tokyo Ohka Kogyo Co., Ltd. (JP) 2017-06-28 EP disclosed
US-9664827-B2 Colored composition, method of producing color filter using the same, color filter and solid-state imaging device FUJIFILM CORPORATION (JP) 2017-05-30 US disclosed
US-9645492-B2 Coloring composition, colored cured film, color filter, solid-state image sensor and image display device FUJIFILM CORPORATION (JP) 2017-05-09 US disclosed
US-20170114245-A1 DISPERSION COMPOSITION, CURABLE COMPOSITION USING THE SAME, TRANSPARENT FILM, MICROLENS AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2017-04-27 US disclosed
EP-2651991-B1 STABLE POLYACRYLIC ACIDS, THEIR MANUFACTURE AND THEIR USE BASF SE (DE) 2017-04-26 EP disclosed
EP-3147334-A1 SURFACE TREATMENT LIQUID TOKYO OHKA KOGYO CO., LTD. (JP) 2017-03-29 EP disclosed
US-20170010530-A1 COLORING COMPOSITION, CURED FILM, COLOR FILTER, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, ORGANIC ELECTROLUMINESCENT ELEMENT, COLORANT, AND METHOD FOR PRODUCING COLORANT FUJIFILM CORPORATION (JP) 2017-01-12 US disclosed
US-20170010528-A1 COLORING COMPOSITION, FILM, COLOR FILTER, PATTERN FORMING METHOD, METHOD OF MANUFACTURING COLOR FILTER, SOLID IMAGE PICKUP ELEMENT, AND INFRARED SENSOR FUJIFILM CORPORATION (JP) 2017-01-12 US disclosed
EP-1867666-A1 OPTICALLY ACTIVE COPOLYMER, PROCESS FOR PRODUCING THE SAME, AND PACKING FOR CHROMATOGRAPHY COMPRISING THE COPOLYMER Nara Institute of Science and Technology (JP) 2007-12-19 EP disclosed
US-7279539-B2 Alkali-soluble polymer and polymerizable composition thereof FUJIFILM CORPORATION (JP) 2007-10-09 US disclosed
US-20070212644-A1 Photosensitive recording material, planographic printing plate precursor, and stacks of the same FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
EP-1829703-A1 Infrared sensitive planographic printing plate precursor FUJIFILM Corporation (JP) 2007-09-05 EP disclosed
US-20070202439-A1 Polymerizable composition and planographic printing plate precursor FUJIFILM CORPORATION 2007-08-30 US disclosed
US-5998340-A Lubricant and magnetic recording medium using the same HITACHI MAXELL, LTD. (JP) 1999-12-07 US disclosed
EP-0296275-B2 Carboxylic acid mixture and process for producing the same IDEMITSU PETROCHEMICAL CO (JP) 1996-10-09 EP disclosed
US-5376465-A Magnetic recording medium having a ferromagnetic thin film and hydrolysis resistant protective layer comprising a tertiary carboxylic acid having at least two fluorine atoms HITACHI MAXELL, LTD. (JP) 1994-12-27 US disclosed
US-5223641-A Catalytic carbonylation of (poly) olefins; acid catalysts, metal oxide; esterifying to nonhydrolyzable ester IDEMITSU PETROCHEMICAL CHEMICAL COMPANY, LIMITED (JP) 1993-06-29 US disclosed
EP-0296275-A1 Carboxylic acid mixture and process for producing the same IDEMITSU PETROCHEMICAL CO. LTD. (JP) 1988-12-28 EP disclosed