SCHEMBL178650

SCHEMBL178650

CCC(C)(C)CC(C)(C(=O)O)C(C)(C)CC

nearest known ligand 0.35

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.33
ALDH1A1 P00352 2/20 0.33
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
HIF1A Q16665 1/20 0.32
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30
THRB P10828 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12035770 0.87 MEN1 (0.31) ALDH1A1MEN1CYP1A2THRBKMT2A
SCHEMBL169944 0.86 TSHR (0.33) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL10093703 0.86 TSHR (0.33) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL12835383 0.85 ALDH1A1 (0.31) ALDH1A1MEN1CYP1A2THRBKMT2A
SCHEMBL12787544 0.84 TSHR (0.32) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL9886728 0.84 TSHR (0.32) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL9710097 0.82 TSHR (0.38) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL15787218 0.82 TSHR (0.31) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL12094456 0.82 TSHR (0.31) TSHRALDH1A1CYP2D6CYP2C19HIF1A
SCHEMBL14394683 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 201 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10844235-B2 Ink, method of manufacturing ink, and ink cartridge RICOH COMPANY, LTD. (JP) 2020-11-24 US disclosed
US-20190136076-A1 INK, METHOD OF MANUFACTURING INK, AND INK CARTRIDGE KOIZUKA YUUSUKE (JP) 2019-05-09 US disclosed
US-20170363959-A1 COLORING PHOTOSENSITIVE COMPOSITION, CURED FILM, PATTERN FORMING METHOD, INFRARED CUT FILTER WITH LIGHT-SHIELDING FILM, SOLID-STATE IMAGING DEVICE, IMAGE DISPLAY DEVICE, AND INFRARED SENSOR FUJIFILM CORPORATION (JP) 2017-12-21 US disclosed
US-9818778-B2 Solid-state image sensor and its manufacturing method, curable composition for forming infrared cut-off filters, and camera module FUJIFILM CORPORATION (JP) 2017-11-14 US disclosed
US-9810821-B2 Infrared ray cutoff filter FUJIFILM CORPORATION (JP) 2017-11-07 US disclosed
US-20170266694-A1 SURFACE TREATMENT METHOD, ANTI-STATIC AGENT, AND HYDROPHILIZING TREATMENT AGENT TOKYO OHKA KOGYO CO., LTD. (JP) 2017-09-21 US disclosed
US-9720319-B2 Colored composition, cured film, color filter, method for manufacturing color filter, solid-state imaging element, image display device, and compound FUJIFILM CORPORATION (JP) 2017-08-01 US disclosed
US-9707749-B2 Lithographic printing plate precursor and plate making method thereof FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-9710117-B2 Transfer material, manufacturing method of electrostatic capacitance type input device, electrostatic capacitance type input device, and image display device including the same FUJIFILM CORPORATION (JP) 2017-07-18 US disclosed
US-20170190167-A1 PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING SAME, AND PRINTING METHOD USING SAME FUJIFILM CORPORATION (JP) 2017-07-06 US disclosed
US-20090047601-A1 PLANOGRAPHIC PRINTING PLATE PRECURSOR AND PRINTING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-02-19 US disclosed
US-7449573-B2 Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition FUJIFILM CORPORATION (JP) 2008-11-11 US disclosed
US-20080266691-A1 Optical filter, and liquid-crystal display device comprising it FUJIFILM CORPORATION (JP) 2008-10-30 US disclosed
US-20080044763-A1 Resin composition and thermo/photosensitive composition FUJIFILM CORPORATION 2008-02-21 US disclosed
US-7306893-B2 Intermediate layer contains a unsaturated polymer having a carboxylic acid group in the side chain, which has specific reaction between the support and the photosensitive layer to promot adhesion strength; improve printing durability, chemical resistance; laser recording, photothermography FUJIFILM CORPORATION (JP) 2007-12-11 US disclosed
US-7279539-B2 Alkali-soluble polymer and polymerizable composition thereof FUJIFILM CORPORATION (JP) 2007-10-09 US disclosed
US-20070231740-A1 A planographic printing plate precursor comprising: an aluminum support; and a photosensitive layer including a polymerization initiator, a polymerizable compound and a binder polymer; an oxygen barrier layer; and a protective layer including a filler; capable of image formation FUJIFILM CORPORATION (JP) 2007-10-04 US disclosed
US-20070190449-A1 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer MITSUBISHI RAYON CO., LTD. (JP) 2007-08-16 US disclosed
US-20070065752-A1 Positive resist composition and pattern forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-22 US disclosed
US-20070054217-A1 Positive photosensitive composition and pattern-forming method using the same FUJI PHOTO FILM CO., LTD. 2007-03-08 US disclosed