Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 3/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | DGKA | P23743 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 2/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | TNF | P01375 | 3/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15198872 | 0.95 | ALDH1A1 (0.49) | GAAKDM4ETDP1ALDH1A1MEN1 | |
| SCHEMBL15779796 | 0.92 | GAA (0.46) | GAAKDM4ETDP1ALDH1A1MEN1 | |
| SCHEMBL22821470 | 0.90 | GAA (0.45) | GAAKDM4ETDP1ALDH1A1MEN1 | |
| SCHEMBL23343652 | 0.86 | GAA (0.42) | GAAKDM4ETDP1ALDH1A1MEN1 | |
| SCHEMBL19652445 | 0.84 | GAA (0.66) | GAAKDM4ETDP1ALDH1A1MEN1 | |
| SCHEMBL16307911 | 0.81 | GAA (0.43) | GAAKDM4ETDP1ALDH1A1MEN1 | |
| SCHEMBL301234 | 0.81 | FNTA (0.44) | GAAKDM4ETDP1ALDH1A1MEN1 | |
| SCHEMBL17467862 | 0.81 | APEX1 (0.44) | GAAKDM4ETDP1ALDH1A1MEN1 | |
| SCHEMBL10297995 | 0.80 | GAA (0.41) | GAAKDM4ETDP1ALDH1A1MEN1 | |
| SCHEMBL128197 | 0.79 | NAAA (0.55) | ALDH1A1MEN1KMT2ADGKAMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9122152-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICALS CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |