Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CDK4 | P11802 | 3/20 | 0.50 |
| ▸ | CCND1 | P24385 | 3/20 | 0.50 |
| ▸ | WEE1 | P30291 | 4/20 | 0.47 |
| ▸ | CHEK1 | O14757 | 3/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.45 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | POLB | P06746 | 2/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
| ▸ | CASP6 | P55212 | 1/20 | 0.45 |
| ▸ | BCHE | P06276 | 3/20 | 0.42 |
| ▸ | ACHE | P22303 | 3/20 | 0.42 |
| ▸ | DAO | P14920 | 1/20 | 0.42 |
| ▸ | DDO | Q99489 | 1/20 | 0.42 |
| ▸ | HTR1D | P28221 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29475607 | 0.81 | BCHE (0.58) | MEN1POLBKMT2ABCHEACHE | |
| SCHEMBL6009655 | 0.81 | BCHE (0.58) | MEN1POLBKMT2ABCHEACHE | |
| SCHEMBL6008274 | 0.79 | BCHE (0.43) | MEN1POLBKMT2ABCHEACHE | |
| SCHEMBL27844288 | 0.75 | BCHE (0.52) | MEN1POLBKMT2ABCHEACHE | |
| SCHEMBL28016354 | 0.73 | HTR1A (0.49) | MEN1KMT2AHTR1DHSD17B10 | |
| SCHEMBL11751554 | 0.73 | ABCG2 (0.55) | MEN1POLBKMT2AGAABCHE | |
| SCHEMBL31287843 | 0.72 | BCHE (0.55) | MEN1POLBKMT2AGAABCHE | |
| SCHEMBL2310171 | 0.72 | BCHE (0.38) | CDK4CCND1MEN1POLBKMT2A | |
| SCHEMBL6008284 | 0.71 | GPR84 (0.43) | MEN1POLBKMT2ABCHEACHE | |
| SCHEMBL6986225 | 0.70 | HTR1D (0.73) | TDP1MEN1KMT2AGAAHTR1D |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10042258-B2 | Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-08-07 | — | — | US | disclosed |
| US-20170293227-A1 | COATING LIQUID FOR RESIST PATTERN COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-9746768-B2 | Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-20170205711-A1 | COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-20 | — | — | US | disclosed |
| US-9494864-B2 | Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-20150362835-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150248057-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-09-03 | — | — | US | disclosed |