Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSD | P07339 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.53 |
| ▸ | RAB9A | P51151 | 2/20 | 0.53 |
| ▸ | MAPT | P10636 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.51 |
| ▸ | HTT | P42858 | 2/20 | 0.51 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.48 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.48 |
| ▸ | RELA | Q04206 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.45 |
| ▸ | PLAU | P00749 | 1/20 | 0.45 |
| ▸ | ALPL | P05186 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2289848 | 0.89 | ALDH1A1 (0.61) | CTSDALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL9647951 | 0.86 | ALDH1A1 (0.58) | CTSDALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL9647969 | 0.84 | ALDH1A1 (0.56) | CTSDALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL9647959 | 0.84 | ALDH1A1 (0.56) | CTSDALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL6206789 | 0.84 | CTSD (0.50) | CTSDALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL31255865 | 0.82 | CTSD (0.59) | CTSDALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL8576742 | 0.82 | CTSD (0.59) | CTSDALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL6551442 | 0.82 | ALDH1A1 (0.61) | CTSDALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL2289856 | 0.81 | ALDH1A1 (0.57) | CTSDALDH1A1NPC1RAB9AMAPT | |
| SCHEMBL10649000 | 0.81 | TDP1 (0.43) | CTSDALDH1A1NPC1RAB9AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111918933-A | Curable resin composition, dry film, cured product, laminated structure, and electronic component | 太阳油墨制造株式会社 | 2020-11-10 | — | — | CN | disclosed |
| CN-106459241-B | Water-based emulsion and film, solidfied material and laminated body | 住友化学株式会社 | 2019-03-01 | — | — | CN | disclosed |
| CN-106459595-A | Aqueous emulsion, coating film, cured object, and laminate | 住友化学株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-106459241-A | Aqueous emulsion, coating film, cured product, and laminate | 住友化学株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-106459596-A | Aqueous emulsion, coating film, cured product, and laminate | 住友化学株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-103415540-B | The manufacture method of photosensitive composite, cured article and active ray cured article | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2016-03-23 | — | — | CN | disclosed |
| CN-103176360-B | Photosensitive composite | SANYO CHEMICAL INDUSTRIES LTD. (JP) | 2015-09-30 | — | — | CN | disclosed |
| US-8853290-B2 | Photosensitive composition | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2014-10-07 | — | — | US | disclosed |
| CN-102459354-B | Photosensitive composition | SANYO CHEMICAL IND LTD | 2014-08-20 | — | — | CN | disclosed |
| US-20140045966-A1 | PHOTOSENSITIVE COMPOSITION. CURED ARTICLE, AND METHOD FOR PRODUCING ACTINICALLY CURED ARTICLE | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2014-02-13 | — | — | US | disclosed |
| US-20120142806-A1 | PHOTOSENSITIVE COMPOSITION | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-07 | — | — | US | disclosed |
| CN-102459354-A | Photosensitive composition | SANYO CHEMICAL IND LTD | 2012-05-16 | — | — | CN | disclosed |
| EP-2441778-A1 | PHOTOSENSITIVE COMPOSITION | Sanyo Chemical Industries, Ltd. (JP) | 2012-04-18 | — | — | EP | disclosed |
| EP-1478978-B1 | SELF-ALIGNED PATTERN FORMATION USING DUAL WAVELENGTHS | ADVANCED MICRO DEVICES INC (US) | 2009-09-23 | — | — | EP | disclosed |
| CN-1299166-C | Self-aligned pattern formation using dual wavelengths | ADVANCED MICRO DEVICES INC (US) | 2007-02-07 | — | — | CN | disclosed |
| CN-1620634-A | Self-aligned pattern formation using dual wavelengths | ADVANCED MICRO DEVICES INC (US) | 2005-05-25 | — | — | CN | disclosed |
| EP-1478978-A2 | SELF-ALIGNED PATTERN FORMATION USING DUAL WAVELENGTHS | ADVANCED MICRO DEVICES, INC. (US) | 2004-11-24 | — | — | EP | disclosed |
| US-6764808-B2 | PHOTOLITHOGRAPHIC EXPOSING WITH TWO DIFFERENT WAVELENGTHS, THE FIRST WAVELENGTH IS SHORTER THAN THE SECOND WAVELENGTH, ACHIEVE SMALLER RESOLUTION; POLYMERIZING ARYLALKOXYSILANE COMPOUND TO POLYSILOXANES | ADVANCED MICRO DEVICES, INC. | 2004-07-20 | — | — | US | disclosed |
| WO-2003073165-A2 | SELF-ALIGNED PATTERN FORMATION USING DUAL WAVELENGTHS | ADVANCED MICRO DEVICES, INC. (US) | 2003-09-04 | — | — | WO | disclosed |
| US-20030162135-A1 | Self-aligned pattern formation using dual wavelengths | ADVANCED MICRO DEVICES, INC. | 2003-08-28 | — | — | US | disclosed |